Effect of Dry Etching to Improve Ohmic Contacts on Bulk, Lightly-Doped β-Ga2O3
Chao-Ching Chiang,
Jian-Sian Li,
Hsiao-Hsuan Wan
et al.
Abstract:Ti/Au is a typical Ohmic metal contact stack to n-type β-Ga2O3 but there have been few systematic studies of the use of pre-exposure of the surface to plasmas prior to metal deposition in order to lower the contact resistance. The effects of Cl2/Ar inductively coupled plasma exposure of Ga2O3 surfaces prior to deposition of Ti/Au (20/80 nm) contacts were examined through circular transfer length method measurements to determine both the contact resistance and specific contact resistivity. ICP source power, whi… Show more
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