Effect of dilution gas on the distribution characteristics of capacitively coupled plasma by comparing SiH4/He and SiH4/Ar
Ho Jun Kim,
Kyungjun Lee,
Hwanyeol Park
Abstract:In this study, we focus on the difference in the spatial distribution of the plasma parameters between SiH4/He capacitively coupled plasma (CCP) and SiH4/Ar CCP. The SiH4/He mixture is modeled using the chemical reactions that were successfully derived in our previous studies. The chemical reaction model of the SiH4/Ar mixture built in this study is based on the detailed set of chemical reactions in Ar. The spatial distribution of the plasma parameters is examined with the aid of a 2D fluid model. The electron… Show more
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