Effect of Dilute Hydrogen Peroxide in Ultrapure Water on SiGe Epitaxial Process

Abstract

Ultrapure water contains dilute hydrogen peroxide as an impurity. In order to clarify an impact of the dilute hydrogen peroxide on cleaning processes, a SiGe epitaxial layer was deposited on a Si(100) wafer which surface was treated by HF last process with hydrogen peroxide contained UPW or hydrogen peroxide removed UPW. The defect in the SiGe epitaxial layer was reduced when the hydrogen peroxide removed UPW was used.

Electron Redistribution in Iridium–Iron Dual-Metal-Atom Active Sites Enables Synergistic Enhancement for H2O2 Decomposition

“…The heterogeneous catalytic decomposition of hydrogen peroxide (H 2 O 2 ) under neutral conditions is a necessary technical guarantee in many areas ranging from clinical therapy, sewage treatment, and semiconductor manufacturing. − In clinical therapy, excess H 2 O 2 is a byproduct of cellular metabolism under oxidative stress, which causes damage to biomolecules and leads to many diseases. Heterogeneous H 2 O 2 decomposition catalysts treat disease by releasing oxidative pressure in cells where the environment is neutral .…”

“…In semiconductor manufacturing, ultrapure water (pH 7) is the basic production material. H 2 O 2 , a byproduct of the preparation process, must be decomposed to meet ultrapure water standards . Therefore, it is of great significance to synthesize heterogeneous H 2 O 2 decomposition catalysts with high catalytic activity under neutral conditions.…”