2019
DOI: 10.1016/j.synthmet.2018.11.009
|View full text |Cite
|
Sign up to set email alerts
|

Effect of different precursors on electrochemical properties of manganese oxide thin films prepared by SILAR method

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
14
0

Year Published

2020
2020
2022
2022

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 30 publications
(14 citation statements)
references
References 40 publications
0
14
0
Order By: Relevance
“…Similarly, morphological changes have been reported for the manganese oxide prepared by acetate, chloride and sulfate precursors. [22] Next, the generated materials were further characterized using XRD and BET methods. Figure 2a presents the X-ray diffraction (XRD) patterns of the nickel cobalt oxides obtained from various precursors.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Similarly, morphological changes have been reported for the manganese oxide prepared by acetate, chloride and sulfate precursors. [22] Next, the generated materials were further characterized using XRD and BET methods. Figure 2a presents the X-ray diffraction (XRD) patterns of the nickel cobalt oxides obtained from various precursors.…”
Section: Resultsmentioning
confidence: 99%
“…[21] Shaikh et al have studied the different precursor's effects on the electrochemical properties of manganese oxide thin films prepared by successive ionic layer adsorption. [22] Recently, mixed transition metal oxides (MTMO) received an increase interest due to their electrochemical and electrocatalytic properties, leading to their use in various applications, including supercapacitors, metal air batteries and fuel cells. [23,24,25,26] Within this materials class, spinel nickel cobaltite oxide (Ni x Co 3À x O 4 ) has been reported as a promising materials.…”
Section: Introductionmentioning
confidence: 99%
“…A study involving the acetate, chloride and sulfate of Mn was recently conducted to deposit Mn 3 O 4 films by successive immersions of stainless-steel substrates in 0.1 m Mn precursor solutions followed by 1 m NaOH solution for 20 s each with intermediate rinses in distilled water for 10 s, for a total deposition of 150 cycles. [203] Again, distinctive differences due to the type of precursor used could be identified: the lowest crystallite size was detected for Mn(CH 3 COO) 2 (15 nm) , followed by MnSO 4 (27 nm), and MnCl 2 (34 nm) . SEM micrographs of fabricated films are presented in Figure 8f-h, exhibiting a compact grain structure for the film prepared by Mn(CH 3 COO) 2 and a greater porosity in the film fabricated by MnCl 2 .…”
Section: Type Of Precursormentioning
confidence: 95%
“…These films were used for energy storage applications, with slightly better performance in terms of charge storage performance for films prepared using MnCl 2 and MnSO 4 compared to those prepared from Mn(CH 3 COO) 2 . [203] In both cases of ZnO and Mn 3 O 4, chloride precursor seems to give rise to larger crystallites suggesting a key role of the counterion participating in the oxide formation.…”
Section: Type Of Precursormentioning
confidence: 96%
See 1 more Smart Citation