Effect of deposition time on structural, electrical and optical properties of Aluminium doped ZnO thin films by RF magnetron sputtering

Tondare, Rajkumar S.; Shivaraj, B.W.; Narasimhamurthy, H. N.; Krishna, M.; Subramanyam, T. K.

doi:10.1016/j.matpr.2018.01.052

Cited by 16 publications

(9 citation statements)

References 10 publications

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“…The diffraction angle of the (002) plane increases from 33.89° to 34.15°, indicating that as the film thickness increases, the residual stress decreases. In addition, the full width at half maximum (FWHM) of the (002) peaks decrease, which may be attributed to an improvement in the structural quality of the crystallites 25…”

Section: Composition and Structural Propertiesmentioning

confidence: 99%

“…When the islands begin to coalesce, the strain tends to be released.AZO crystallites deposited by the described method at a lower deposition temperature are larger than those of ZnO reported in the literature24 .The diffraction angle of the (002) plane increases from 33.89° to 34.15°, indicating that as the film thickness increases, the residual stress decreases. In addition, the full width at half maximum (FWHM) of the (002) peaks decrease, which may be attributed to an improvement in the structural quality of the crystallites25 . The FWHM is related to the crystallite size via the Scherrer equation26…”

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confidence: 99%

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Growth Evolution of AZO thin Films Deposited by Magnetron Sputtering at Room Temperature

et al. 2021

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Thin AZO films were grown by RF magnetron sputtering for different deposition times in argon plasmas. Optical, structural, and morphological properties, together with elemental composition, were studied and correlated with the observed effects on the electrical properties and compared with two models of mobility scattering (ionized impurities and grain boundaries). The results suggest that the carrier density in the studied case is limited to below 15% owing to the low ionization efficiency caused by the formation of neutral impurities as homologous phases. While the spread in the mobility during the initial stages of film growth is strongly influenced by grain boundaries, in thicker films the limitation on ion efficiency becomes more significant.

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Section: Composition and Structural Propertiesmentioning

confidence: 99%

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confidence: 99%

Growth Evolution of AZO thin Films Deposited by Magnetron Sputtering at Room Temperature

et al. 2021

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“…At low total pressure conditions (<11.5 mTorr), anatase (101) exists at low sputtering power (200 W), whereas mixed anatase and rutile phases formed at high RF power (200 to 300 W). Anatase (112) is obtained only at high levels of RF power and high total pressure. These findings are confirmed by using a high RF power, resulting in a mixture of highly crystalline anatase and rutile phases [55].…”

Section: Sputtering Powermentioning

confidence: 99%

“…The effects of the argon/oxygen ratio on the crystallinity and surface chemical composition of TiO 2 films have been investigated in many studies [79,83,105,106,[110][111][112]. Oxygen plays an important role in the preparation of TiO 2 films via magnetron sputtering.…”

Section: Argon/oxygen Ratiomentioning

confidence: 99%

A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron-Sputtering Technique

Wang

Rahman

et al. 2020

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Titanium dioxide (TiO2) thin films are used for a broad range of applications such as wastewater treatment, photocatalytic degradation activity, water splitting, antibacterial and also in biomedical applications. There is a wide range of synthesis techniques for the deposition of TiO2 thin films, such as chemical vapor deposition (CVD) and physical vapor deposition (PVD), both of which are well known deposition methods. Layer by layer deposition with good homogeneity, even thickness and good adhesive nature is possible by using the PVD technique, with the products being used for photocatalytic applications. This review studies the effects of magnetron sputtering conditions on TiO2 films. This innovative technique can enhance the photocatalytic activity by increasing the thickness of the film higher than any other methods. The main purpose of this article is to review the effects of DC and RF magnetron sputtering conditions on the preparation of TiO2 thin films for photocatalysis. The characteristics of TiO2 films (i.e., structure, composition, and crystallinity) are affected significantly by the substrate type, the sputtering power, the distance between substrate and target, working pressure, argon/oxygen ratio, deposition time, substrate temperature, dopant types, and finally the annealing treatment. The photocatalytic activity and optical properties, including the degree of crystallinity, band gap (Eg), refractive index (n), transmittance (T), and extinction coefficient (k), of TiO2 films are dependent on the above- mentioned film characteristics. Optimal TiO2 films should have a small particle size, a strong degree of crystallinity, a low band gap, a low contact angle, a high refractive index, transmittance, and extinction coefficient. Finally, metallic and nonmetallic dopants can be added to enhance the photocatalytic activity of TiO2 films by narrowing the band gap.

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“…In these ITO thin films, indium is more than 90% in composition [10] and is an increasingly expensive and scarce element [11]. Alternative TCO materials with substituted or reduced use of indium having desired opto-electrical characteristics are being developed through vacuum-intensive physical vapor deposition methods like magnetron sputtering [12], radio frequency [13], and direct current [14,15] sputtering along with atomic layer deposition [16], aerosol assisted [17], atmospheric pressure [18], and chemical vapor deposition methods. These electrodes are also obtained through solution processes like spin-coating [19,20], dip-coating [21], and spray pyrolysis [22][23][24].…”

Section: Introductionmentioning

confidence: 99%

Solution Combustion Synthesis of Transparent Conducting Thin Films for Sustainable Photovoltaic Applications

et al. 2020

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Sunlight is arguably the most promising continuous and cheap alternative sustainable energy source available at almost all living places of the human world. Photovoltaics (PV) is a process of direct conversion of sunlight into electricity and has become a technology of choice for sustainable production of cleaner and safer energy. The solar cell is the main component of any PV technology and transparent conducting oxides (TCO) comprising wide band gap semiconductors are an essential component of every PV technology. In this research, transparent conducting thin films were prepared by solution combustion synthesis of metal oxide nitrates wherein the use of indium is substituted or reduced. Individual 0.5 M indium, gallium and zinc oxide source solutions were mixed in ratios of 1:9 and 9:1 to obtain precursor solutions. Indium-rich IZO (A1), zinc-rich IZO (B1), gallium-rich GZO (C1) and zinc-rich GZO (D1) thin films were prepared through spin coating deposition. In the case of A1 and B1 thin films, electrical resistivity obtained was 3.4 × 10−3 Ω-cm and 7.9 × 10−3 Ω-cm, respectively. While C1 films remained insulating, D1 films showed an electrical resistivity of 1.3 × 10−2 Ω-cm. The optical transmittance remained more than 80% in visible for all films. Films with necessary transparent conducting properties were applied in an all solution-processed solar cell device and then characterized. The efficiency of 1.66%, 2.17%, and 0.77% was obtained for A1, B1, and D1 TCOs, respectively, while 6.88% was obtained using commercial fluorine doped SnO2: (FTO) TCO. The results are encouraging for the preparation of indium-free TCOs towards solution-processed thin-film photovoltaic devices. It is also observed that better filtration of precursor solutions and improving surface roughness would further reduce sheet resistance and improve solar cell efficiency.

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Effect of deposition time on structural, electrical and optical properties of Aluminium doped ZnO thin films by RF magnetron sputtering

Cited by 16 publications

References 10 publications

Growth Evolution of AZO thin Films Deposited by Magnetron Sputtering at Room Temperature

Growth Evolution of AZO thin Films Deposited by Magnetron Sputtering at Room Temperature

A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron-Sputtering Technique

Solution Combustion Synthesis of Transparent Conducting Thin Films for Sustainable Photovoltaic Applications

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