Effect of Deposition Temperature on the Surface, Structural, and Mechanical Properties of HfO2 Using Chemical Vapor Deposition (CVD)

Bi, Mengran; Zhu, Jiang; Luo, Yuan; Hongzhong, Cai; Li, Xuming; Wang, Xian; Yan, Wei; Wang, Xiao; Hu, Changyi; Hu, Jinquan; Zhang, Guixue; Wang, Xingqiang; Zhang, Xuxiang

doi:10.3390/coatings12111731

Cited by 4 publications

(3 citation statements)

References 20 publications

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“…These phenomena were observed previously in the case of crystal growing by ALD [22], but in that case, the structure was related to higher temperatures that favor smoother surfaces with a higher crystalline structure. Nevertheless, in both cases, there was a smaller and relatively general granular structure convoluted with the formation of large mounds [29].…”

Section: Resultsmentioning

confidence: 87%

Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering

Araiza,

Álvarez-Fraga,

Gago

et al. 2023

Materials

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Hafnium oxide films were deposited on sapphire and silicon (100) substrates using the DC reactive magnetron sputtering technique from a pure hafnium target at different discharge power levels. The influence of the cathode power on the chemical composition, morphology, crystallographic structure and optical properties of the films was investigated. X-ray diffraction (XRD), energy dispersive X-ray analysis (EDX) and Fourier-transform infrared spectroscopy (FTIR) were employed to determine the chemical composition and bonding structure. In all cases, the films were found to be amorphous or nanocrystalline with increased crystalline content as the sputtering power was increased, according to XRD and FTIR. In addition, EDX showed that the films were oxygen-rich. The effect of power deposition on the surface topography and morphology of the films was studied using atomic force microscopy (AFM) and scanning electron microscopy (SEM). The AFM and SEM images revealed the emergence of mound morphologies as the cathode power was increased. These features are related to blistering effects probably due to the presence of stress and its promotion within the film thickness. Finally, the optical properties showed an average transmission of 80% in the visible range, and the refractive index determined by spectral ellipsometry (SE) was found to be in the range of 1.85–1.92, close to the reported bulk value. SE was also used to study the film porosity observed by SEM, which can be related to the oxygen-rich character of the films.

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Section: Resultsmentioning

confidence: 87%

Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering

Araiza,

Álvarez-Fraga,

Gago

et al. 2023

Materials

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“…The increase in the temperature leads to an increase in the growth rate of the nuclei, and the particles begin to fuse with each other to form cellular particles. Therefore, the porosity of the coating decreases, while its density increases (Bi et al, 2022). Furthermore, at a high temperature, the movement of gas molecules inside the chamber will be higher, which results in a rough surface and film thickness.…”

Section: Thickness and Morphological Analysismentioning

confidence: 99%

A temperature-based synthesis and characterization study of aluminum-incorporated diamond-like carbon thin films

Ghadai,

Shanmugasundar,

Cepova

et al. 2023

Front. Mech. Eng.

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The present work deals with the study of various properties of aluminum (Al)-incorporated diamond-like carbon (DLC) thin films synthesized using the atmospheric pressure chemical vapor deposition (APCVD) technique by varying the deposition temperature (Td) and keeping the N2 flow rate constant. Surface morphology analysis, resistance to corrosion, nanohardness (H), and Young’s modulus (E) of the coatings were carried out using atomic force microscopy (AFM), corrosion test, scanning electron microscopy (SEM), and nanoindentation test, respectively. SEM results showed a smoother surface morphology of the coatings grown at different process temperatures. With an increase in process temperature, the coating roughness (Ra) lies in the range of 20–36 µm. The corrosion resistance of the coating was found to be reduced with a consecutive increase in the deposition temperature from 800℃ to 880℃. However, above 880℃, the resistance increases further, and it may be due to the presence of more Al weight percentage in the coating. The nanoindentation result revealed that H and E of the coating increase with an increase in the CVD process temperature. The elastic–plastic property indicated by H/E and H3/E2, which are also indicators of the wear properties of the coating, were studied using the nanoindentation technique. The residual stresses (σ) calculated using Stoney’s equation revealed a reduction in residual stress with an increase in the process temperature.

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“…It is necessary to select the appropriate preparation methods and process conditions according to the performance requirements, production scale, the application environment, and other factors. At present, the common preparation methods for HfO 2 coatings are chemical vapor deposition (CVD) [26], physical vapor deposition (PVD) [27], the sol-gel method [28], atomic layer deposition (ALD) [29], sintering [30], etc. The preparation cycles of the sol-gel, ALD, and PVD methods are longer than the others.…”

Section: Introductionmentioning

confidence: 99%

Oxidation Resistance of Ir/HfO2 Composite Coating Prepared by Chemical Vapor Deposition: Microstructure and Elemental Migration

Zhu,

Li,

Cai

et al. 2024

Coatings

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In this study, a HfO2 coating was developed on an Ir matrix using a customized open-tube airflow, cold-wall chemical vapor deposition instrument. The preparation process and structure of the as-prepared coating were investigated to gain insights into its characteristics. The HfO2 coating effectively prevents direct contact between Ir and O, leading to a reduction in the oxidation rate of Ir. Furthermore, defects such as micropores and cracks generated during sealed oxidation erosion contribute to Ir’s decelerated oxidation failure. The as-prepared HfO2 coating exhibits low thermal conductivity and a high heat radiation rate, reducing the coating’s surface temperature. These characteristics significantly enhance adversity tolerance and increase the working temperature of the coating. Moreover, the as-prepared HfO2 coating can serve as a diffusion barrier, blocking both the direct contact of O with the Ir coating and the diffusion of other elements to the Ir coating. As a result, the rates of diffusion of other elements to the Ir coating are reduced.

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Effect of Deposition Temperature on the Surface, Structural, and Mechanical Properties of HfO2 Using Chemical Vapor Deposition (CVD)

Cited by 4 publications

References 20 publications

Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering

Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering

A temperature-based synthesis and characterization study of aluminum-incorporated diamond-like carbon thin films

Oxidation Resistance of Ir/HfO2 Composite Coating Prepared by Chemical Vapor Deposition: Microstructure and Elemental Migration

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