Effect of deposition parameters on structural, mechanical and electrochemical properties in Ti/TiN thin films on AISI 316L substrates produced by r. f. magnetron sputtering

Domínguez‐Crespo, M.A.; Torres‐Huerta, A.M.; Rodríguez, E.; González-Hernández, Andrés; Brachetti-Sibaja, S.B.; Dorantes-Rosales, Héctor J.; López‐Oyama, A.B.

doi:10.1016/j.jallcom.2018.02.319

Cited by 39 publications

(9 citation statements)

References 65 publications

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“…Meanwhile, the individual layer thickness also exerts great impacts on the microstructure change of multilayer films, such as the flatness of interfaces, defect density, and coherency [23][24][25][26]. When the total thickness of the multilayer films is constant, the thinner the individual layer thickness, the higher the interface density, which may significantly affect many properties of films including the irradiation tolerance.…”

Section: Introductionmentioning

confidence: 99%

Recent Studies on the Fabrication of Multilayer Films by Magnetron Sputtering and Their Irradiation Behaviors

Jin

Jian

et al. 2021

Coatings

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Multilayer films with high-density layer interfaces have been studied widely because of the unique mechanical and functional properties. Magnetron sputtering is widely chosen to fabricate multilayer films because of the convenience in controlling the microstructure. Essentially, the properties of multilayer films are decided by the microstructure, which could be adjusted by manipulating the deposition parameters, such as deposition temperature, rate, bias, and target–substrate distance, during the sputter process. In this review, the influences of the deposition parameters on the microstructure evolution of the multilayer films have been summarized. Additionally, the impacts of individual layer thickness on the microstructure evolution as well as the irradiation behavior of various multilayer films have been discussed.

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Section: Introductionmentioning

confidence: 99%

Recent Studies on the Fabrication of Multilayer Films by Magnetron Sputtering and Their Irradiation Behaviors

Jin

Jian

et al. 2021

Coatings

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“…Transition metal based nitrides like TiN, ZrN, TaN and CrN coatings are applied on of metallic substrates used in numerous applications; automobile parts also as wear resistant coatings for cutting tools coatings, bio-implants, and decorative coating [1,3].…”

Section: Introductionmentioning

confidence: 99%

“…TiN received a great attention in the resent years, where researches confirmed that titanium nitride can improve corrosion and wear resistant, and lifetime of the materials up to 400% [3] thanks to its high hardness, high thermal stability, low electrical resistivity, high wear and excellent corrosion resistance chemical stability and biocompatibility, adding the interesting optical properties [4,5].…”

Section: Introductionmentioning

confidence: 99%

“…The cross section of scanning electron microscopy and profilometer measurements indicate an average film thickness between 320 and 860 nm in dependence of the sputtered parameters, the largest increase in hardness was from ~5 to ~20 GPa with a friction coefficient (μ) that varies from 0.012 to 1.3. Power and substrate temperature played the most important role in the final properties of Ti/TiNbilayered coatings [15]. E. Ajenifuja et al, sputtered with different thicknesses of TiNx thin film with varying time from 5 to 20 min, using DC reactive magnetron sputtering technique.…”

Section: Introductionmentioning

confidence: 99%

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Mechanical and Tribological Behaviors of Nanocomposite Titanium Nitrides Coatings

Belgroune

Aissani

Salhi

et al. 2021

DDF

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TiN coatings with a thickness of 2 μm were deposited using the magnetron sputtering has developed rapidly over the last decade in such a way that it has become an established process of choice for the deposition of a wide range in various applications for different domains as it gives excellent performance in many aspects. In view of this, we have deposited the TiN coatings by magnetron sputtering using Ti target at different nitrogen content to study the influence of the nitrogen content on the mechanical properties and tribological behaviors of the TiN coatings were systematically investigated using nanoindentation and a pin-on-disk tribometer. Nanoindentation results shows that the hardness and Young's modulus of the TiN coatings increase with increasing N content in the coatings.Wear test results indicate that the wear rate and friction coefficient of the XC100 steel substrate were significantly reduced by deposition of the TiN coatings, and the tribological behaviors of the TiN coatings are strongly dependent on the nitrogen content in the coatings.

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“…5 Typically, properties and structures of TiN coatings for various applications using this technique depend on coating conditions including oblique angle, Ar pressure, Ar to N 2 flow-rate ratio. [6][7][8][9] The main advantage of this technique is the ability to control the diameter, shape and density of nanostructures by varying the deposition conditions consisting of oblique angle, rotation speed, operating pressure, gas-mixing ratio and sputtering power. The technique is used for a TiN hard coating to produce a high-density nanocolumnar structure that can have an extreme hardness, low friction coefficient and very high wear resistance.…”

Section: Introductionmentioning

confidence: 99%

Process factors affecting deposition rate of TiN coating on a machine component

Saikaew¹

2019

Mater. Tehnol.

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In this work, a titanium nitride (TiN) coating applied with the oblique-angle DC-magnetron sputtering technique was systematically studied using designed experiments. The TiN layer was applied on an upper hook, which is a machine component of a fishing-net weaving machine. The goal was to investigate the influence of sputtering process factors on the deposition rate and to find appropriate operating conditions for statistically significant factors in order to improve the thin-film manufacturing process, raising the quality of the TiN coating. Five process factors including the oblique angle, rotational speed, sputtering DC current, operating pressure and Ar to N2 flow-rate ratio were simultaneously investigated using the 2 5-1 fractional factorial design method. A normal probability plot of effects, and main and interaction-effect plots of the process factors were constructed in order to identify the significant process factors and the appropriate operating conditions. The main factors including the oblique angle, sputtering DC current, operating pressure, gas-mixing ratio, interactions between the oblique angle and sputtering DC current, and interactions between the oblique angle and gas-mixing ratio were found to be statistically significant process factors. Moreover, the appropriate operating conditions for the significant process factors were obtained with the graphical method.

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Effect of deposition parameters on structural, mechanical and electrochemical properties in Ti/TiN thin films on AISI 316L substrates produced by r. f. magnetron sputtering

Cited by 39 publications

References 65 publications

Recent Studies on the Fabrication of Multilayer Films by Magnetron Sputtering and Their Irradiation Behaviors

Recent Studies on the Fabrication of Multilayer Films by Magnetron Sputtering and Their Irradiation Behaviors

Mechanical and Tribological Behaviors of Nanocomposite Titanium Nitrides Coatings

Process factors affecting deposition rate of TiN coating on a machine component

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