Effect of deposition conditions on mechanical stresses and microstructure of sputter-deposited molybdenum and reactively sputter-deposited molybdenum nitride films

Shen, Y.G.

doi:10.1016/s0921-5093(03)00336-8

Cited by 93 publications

(32 citation statements)

References 21 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Similar density values were obtained for Mo 2 N in Ref. [13]. For the Mo–Si–N films studied the density varies with composition between 4.2 and 5.3 g cm −3 , the closer the alloy composition is to silicon nitride in the ternary phase diagram, the lower is the density.…”

Section: Resultssupporting

confidence: 85%

See 1 more Smart Citation

Amorphous Mo–N and Mo–Si–N films in microelectromechanical systems

Kattelus

Ylönen

Blomberg

2005

Fatigue Fract Eng Mat Struct

View full text Add to dashboard Cite

A B S T R A C T Micromachining based on metallic structural material possesses several inherent advantages. Metallic thin films can be deposited at room temperature by various means. In microelectromechanical systems they can thus be fabricated on top of polymeric sacrificial materials. The sacrificial layer is finally removed in oxygen plasma either before or after wafer dicing with no need for wet processing. However, in metallic micromachining, it is not trivial to find materials and processes producing structural layers with well-controlled and uniform mechanical characteristics. Amorphous alloys Mo-N and Mo-Si-N are investigated in this study for the purpose, showing properties superior to polycrystalline metals for microelectromechanical devices and systems applications.

show abstract

Section: Resultssupporting

confidence: 85%

“…The bow measured in two perpendicular directions on the wafer is identical in the case of Mo–Si–N but differs greatly for Mo. In all cases the average net stress can be tuned from compressive to tensile by increasing the argon pressure in sputtering 11–13 …”

Section: Resultsmentioning

confidence: 91%

Amorphous Mo–N and Mo–Si–N films in microelectromechanical systems

Kattelus

Ylönen

Blomberg

2005

Fatigue Fract Eng Mat Struct

View full text Add to dashboard Cite

show abstract

“…Common deposition methods include electron beam evaporation [4,5] or sputtering, using either a direct current (DC) [3,[6][7][8][9] or radio frequency (RF) [10][11][12] technique.…”

Section: Introductionmentioning

confidence: 99%

Electrical, morphological and structural properties of RF magnetron sputtered Mo thin films for application in thin film photovoltaic solar cells

et al. 2011

View full text Add to dashboard Cite

Molybdenum (Mo) thin films were deposited using radio frequency (RF) magnetron sputtering, for application as a metal back contact material in "substrate configuration" thin film solar cells. The variations of the electrical, morphological, and structural properties of the deposited films with sputtering pressure, sputtering power and post-deposition annealing were determined. The electrical conductivity of the Mo films was found to increase with decreasing sputtering pressure and increasing sputtering power. X-ray diffraction data showed that all the films had a (110) preferred orientation that became less pronounced at higher sputtering power while being relatively insensitive to process pressure. The lattice stress within the films changed from tensile to compressive with increasing sputtering power and the tensile stress increased with increasing sputtering pressure. The surface morphology of the films changed from pyramids to cigar-shaped grains for a sputtering power between 2 100 and 200 W, remaining largely unchanged at higher power. These grains were also observed to decrease in size with increasing sputtering pressure. Annealing the films was found to affect the resistivity and stress of the films. The resistivity increased due to the presence of residual oxygen and the stress changed from tensile to compressive. The annealing step was not found to affect the crystallisation and grain growth of the Mo films.

show abstract

“…Moreover, the ATCLV-NMC-seed film with too small grains seems to impose tensile stresses in the subsequently grown ZnO:Al film. The deposition conditions which usually govern film microstructure and final functional properties [26][27][28] were fixed in our work, and hence, were not in the focus of our investigation. But just a creation of compressive stresses in ZnO:Al films on glass points on an important role of deposition process for the film growth.…”

Section: Functional Zno:al Films On Different Nmc-seed Layersmentioning

confidence: 99%