Effect of Cr(III) solution chemistry on electrodeposition of chromium

Surviliene, S.; Nivinskienė, Ona; Češūnienė, A.; Selskis, A.

doi:10.1007/s10800-005-9105-8

Cited by 80 publications

(29 citation statements)

References 11 publications

(29 reference statements)

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“…have been investigated as a complexing agent for Cr 3+ ions to improve the current efficiency for Cr deposition. Furthermore, N-containing compounds such as glycine [10], urea [11][12][13], thiocyanate [14], etc. have been also investigated to improve the surface appearance of Cr deposits.…”

Section: +mentioning

confidence: 99%

Soft magnetic properties of Ni–Cr and Co–Cr alloy thin films electrodeposited from aqueous solutions containing trivalent chromium ions and glycine

2012

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Abstract.Ferromagnetic Ni-Cr and Co-Cr alloy thin films were electrodeposited from aqueous solution containing trivalent chromium (Cr 3+ ) ions and glycine. According to the Tafel slopes obtained from the cathode polarization curves for Ni-Cr and Co-Cr alloy deposition, it was estimated that Cr 3+ ions inhibited Ni 2+ and Co 2+ ions from electrodepositing. Ni and Co preferentially electrodeposited rather than Cr and the electrodeposition process of Ni-Cr and Co-Cr was categorized to "normal co-deposition type." At the cathode potential of -1.8 V vs.Ag/AgCl/KCl sat., Ni-9.5%Cr and Co-8.4%Cr alloy deposits were obtained. X-ray diffraction patterns of the electrodeposits revealed that pure Ni and pure Co consist of large crystal grains, while Ni-9.5%Cr and Co-8.4%Cr alloys were composed of a solid solution phase with fine crystal grains. Magnetization of Ni-9.5%Cr and Co-8.4%Cr alloy thin films with fine crystalline phase reached to saturation at ca. 2.5 kOe in perpendicular direction to the film plane while pure Ni and pure Co thin film with large crystal grains were hardly magnetized in the perpendicular direction. Soft magnetic properties were improved with increasing Cr content in the deposits.

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Section: +mentioning

confidence: 99%

Soft magnetic properties of Ni–Cr and Co–Cr alloy thin films electrodeposited from aqueous solutions containing trivalent chromium ions and glycine

2012

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“…Baral [8], Baosong [10] and Survilliene [9,11] have studied the effect of the operating conditions such as the pH, temperature, current density and adding agents on the cathodic efficiency, morphology and structure of deposits, obtaining a response variable dependence in all cases.…”

Section: +3mentioning

confidence: 99%

“…It can be seen that oxygen was incorporated into all samples, perhaps in the form of an oxide or hydroxide due to the pH increase in the cathode during the electrode reaction. Phosphorus was also incorporated to the coatings when hypophosphite was added to the solution, as found by XPS analysis in [9][10][11]. On the other hand, aluminum was not detected by EDX measurements in coatings obtained from solutions containing AlCl 3 .…”

Section: Uv-visible Spectramentioning

confidence: 99%

Corrosion Resistance of Decorative Chromium Films Obtained From Trivalent Chromium Solutions

Suárez

Olaya

Suárez

et al. 2012

J. Chil. Chem. Soc.

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In this work, the resistance to corrosion of chromium films obtained from trivalent chromium solutions of different compositions and the influence of solution compounds on the coatings electrochemical behavior and the microstructure were studied. The chromium coatings were obtained from trivalent solutions in a chloride-based bath with different complexing agents adding also sodium hypophosphite and aluminum chloride. UV-vis spectroscopy was carried out on all solutions before and after plating to observe changes in the chromium complexes chemical state due to the plating process. Scanning Electron Microscopy (SEM) and Energy Dispersive X-ray (EDX) were performed to examine the coatings surface morphology and composition; respectively. The coulometric method was used for measuring coating thickness. Electrochemical impedance spectroscopy (EIS) was done using 3% NaCl as electrolyte and using a three-electrode cell with a standard calomel electrode (SCE) as reference. Bright chromium films were obtained from all baths however, differences were observed concerning morphology, thickness and corrosion resistance depending on the composition of the forming solution.Keywords: Trivalent chromium, plating, microstructure, corrosion resistance. [9,11] have studied the effect of the operating conditions such as the pH, temperature, current density and adding agents on the cathodic efficiency, morphology and structure of deposits, obtaining a response variable dependence in all cases.Other authors have reported the effect of reaction conditions during Cr +3 complexation in previous works [2][3], as well as the effect of sodium formate and acetate present in the solution on the chromium film morphology and corrosion resistance. In this work sodium hypophosphite and aluminum chloride were added to the basic formate and formate plus acetate baths to study the electrochemical behavior of the chromium films. Electrochemical impedance spectroscopy (EIS) was used to study the electrochemical behavior of the chromium coatings. The coating morphology and composition were studied by Scanning electron microscopy (SEM) and Energy dispersive X-ray (EDX) and films thickness was measured by the coulometric method [12] which also allow us to calculate the cathode efficiency. EXPERIMENTAL DETAILS Experimental designThe underlying goal of this study was to correlate chromium coating corrosion resistance to a set of factors such as: complexing, addition agents and time exposition to a corrosive environment. The Minitab software was used for designing and analyzing the experiments; Variance analysis (ANOVA) was used for analyzing the experimental results. The experimental order was randomized to ensure against the effect of time-related variables and also to satisfy statistical requirements independence of the observations. Each experiment was carried out with two replicates, until experiments were completed according to the design layout. ElectroplatingAll chemicals used were Sigma Aldrich reagent grade. Solutions were formulated wit...

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“…It has been shown that problems in syn thesis of thick Cr deposits from Cr(III) solutions are primarily due to the processes of hydrolysis of the elec trolyte components in the near electrode layer and further inclusion of low soluble hydroxy compounds of chromium into the deposit [12,13]. Therefore, a correct choice of the nature and concentration of organic additives (ligands, buffers, water-soluble polymers) allowing providing the optimum state of the near electrode layer in the process of chromium plat ing and suppressing hydroxide formation is of funda mental importance [14][15][16][17][18].…”

Section: Introductionmentioning

confidence: 99%

“…Nanoc rystalline chromium-carbon alloys were deposited from these electrolytes at a rather high current effi ciency, reaching 30% or more (at a deposition rate of 1-1.5 µm/min or more) [3,4,17,18,[22][23][24].…”

Section: Introductionmentioning

confidence: 99%

Electrodeposition of nanocrystalline chromium-carbon alloys from electrolyte based on trivalent chromium sulfate using pulsed current

Данилов

Protsenko

Gordiienko

et al. 2012

Prot Met Phys Chem Surf

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Effect of Cr(III) solution chemistry on electrodeposition of chromium

Cited by 80 publications

References 11 publications

Soft magnetic properties of Ni–Cr and Co–Cr alloy thin films electrodeposited from aqueous solutions containing trivalent chromium ions and glycine

Soft magnetic properties of Ni–Cr and Co–Cr alloy thin films electrodeposited from aqueous solutions containing trivalent chromium ions and glycine

Corrosion Resistance of Decorative Chromium Films Obtained From Trivalent Chromium Solutions

Electrodeposition of nanocrystalline chromium-carbon alloys from electrolyte based on trivalent chromium sulfate using pulsed current

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