Effect of Cr alloying on friction and wear of sputter-deposited nanocrystalline (MoxCr1−x)5Si3 films

Influences of parameters on microstructures and mechanical properties of Cr13Ni5Si2 based composite coating by laser-induction hybrid cladding

“…As a result, its toughness and resistance to cracks formation and propagation increased. It has been reported that the wear resistance of the hard materials is closely related to the ratio of H/E of it [26]. In Fig.…”

“…On the other hand, the higher the toughness, the better the fatigue resistance of the composite coating. Usually, a low E means the load will distribute over a wider area, which indicates that the nominal work stress in the materials will decrease [25,26]. As a result, its toughness and resistance to cracks formation and propagation increased.…”

Effect of O2 increase on properties of vanadium oxide coatings

“…These critical forces, as it was reported, are also a good indicator of the load bearing capacity, fracture toughness and abrasion resistance of the thin films. 24,25 a Bragg Brentano and rocking curves at 0?6 sccm O 2 ; b Bragg Brentano and rocking curves at 1 sccm O 2 ; c Bragg Brentano and rocking curves at 1?6 sccm O 2 3 XRD patterns of VO x thin films deposited It could be observed that all the values corresponding to the critical forces increased slightly up to a concentration of 1 sccm of O 2 , clearly demonstrating that coating adhesion is strongly dependent on the oxygen content during its processing. Above this concentration, these values decreased markedly.…”

Role of Cr additions in enhancing wear and oxidation resistance of (Mo1−xCrx)Si2 nanocrystalline films

“…Furthermore, diffusion of alloying elements at the interface between the films and substrate will also affect the composition of the deposited films. Inside the chamber, one cathode is used as the target and the other as the substrate, as described elsewhere [21]. Optimized deposition parameters for the films were as follows: base pressure, 4 Â 10 À 4 Pa; target electrode bias voltage, À 900 V; substrate bias voltage, À 300 V; substrate temperature, 800 1C; working pressure (Ar gas, 99.99% purity), 35 Pa; parallel distance between the source electrode and the substrate, 15 mm and treatment time of 5 h. The sputtering targets were fabricated from ball-milled Mo (99.99% purity), Cr (99.99% purity) and Si powders (99.99% purity) by employing cold compaction under a pressure of 600 MPa.…”