2019
DOI: 10.1134/s1063784219100268
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Effect of Conductivity Type and Doping Level of Silicon Crystals on the Size of Formed Pore Channels during Anodic Etching in Hydrofluoric Acid Solutions

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Cited by 6 publications
(2 citation statements)
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“…Pore formation in silicon during anodic etching is related to anodic polarization in aqueous HF solution and depends on the electrode potential and HF concentration. Various mechanisms of the formation of porous layers are described in the literature [17][18][19][20][21]. Figures 3 and 4 show the results of the formation of nanoporous layers on silicon wafers of n-type and p-type conductivity, with the same resistivity v = 0.002 Ω cm, orientation of the surface of the plates (100).…”
Section: Nanostructured Layers Based On Heavily Doped Siliconmentioning
confidence: 99%
“…Pore formation in silicon during anodic etching is related to anodic polarization in aqueous HF solution and depends on the electrode potential and HF concentration. Various mechanisms of the formation of porous layers are described in the literature [17][18][19][20][21]. Figures 3 and 4 show the results of the formation of nanoporous layers on silicon wafers of n-type and p-type conductivity, with the same resistivity v = 0.002 Ω cm, orientation of the surface of the plates (100).…”
Section: Nanostructured Layers Based On Heavily Doped Siliconmentioning
confidence: 99%
“…Tang D. and co-authors showed that porosity of cathode diffusion layer has a significant effect on the oxygen mass transfer and removal of liquid water in direct ethanol fuel cell [15]. The porosity and specific surface area of porous silicon depend on a few parameters: the type of conductivity and resistivity of the silicon wafer [16,17], the composition and temperature of the electrolyte for etching [18,19], the illumination of the reaction zone [20,21] and metal composition deposed on Si [22]. The influence of these parameters is intensively studied.…”
Section: Introductionmentioning
confidence: 99%