Effect of chemical additive on fixed abrasive pad self-conditioning in CMP

Li, Jun; Huang, Jian‐Dong; Xia, Lei; Zhu, Yongwei; Zuo, Dunwen

doi:10.1007/s00170-016-8771-5

Cited by 15 publications

(4 citation statements)

References 19 publications

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“…It is found that the quartz glass powder is detected in the pore area of the test sample surface at the diffraction angle of about 20 degrees after the experiments. It was demonstrated that the materials blocking the surface pores of FAP are wear debris of polishing pad and quartz glass powder (Li et al , 2017;Li et al , 2014;Tang et al , 2020). The debris particles concentration at the contact interface is increased, and the pore on the sample surface is more easily blocked, which results in the low surface roughness value (Lu et al , 2002; Zheng et al , 2017).…”

Section: Resultsmentioning

confidence: 99%

Tribological glazing evolution of fixed abrasive pad under different polishing solution conditions

Tian,

Wu,

Pang

et al. 2023

ILT

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Purpose This study aims to clarify the influence mechanism of polishing solution type on the glazing evolution of fixed abrasive pad under different interfacial pressure conditions. Design/methodology/approach The tribological experiments were carried out on the friction and wear machinery with W3-5 diamond fixed abrasive pad and quartz glass workpiece under three polishing solution types of five pressure conditions. The changes of surface morphology, porosity and hardness of fixed abrasive pad were detected by white light interferometer, optical microscope and shore hardness tester. Findings The results showed that the glazed phenomenon of fixed abrasive pad is occurred after a certain time, which is more obvious with the increasing of interfacial pressures. The polishing solution type has a significant effect on the glazing time, although the glazed phenomenon is inevitable. The mechanism of it is that the micro-convex peaks on the surface of the fixed abrasive pad are easily wear, and the pores are blocked by the accumulation of waste debris generated during the experiment process. Thus, a smooth and high-density hard layer is formed on the surface of the fixed abrasive pad which induces the decreasing of the friction coefficient and surface roughness value. For selected polishing solution types, the wear rate of micro-convex peaks is different due to the corrosion action difference with polishing pad surface. Originality/value The main contribution of this work is to provide a new investigating method for further understanding the glazing evolution mechanism of fixed abrasive pad. Peer review The peer review history for this article is available at: https://publons.com/publon/10.1108/ILT-08-2023-0257/

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Section: Resultsmentioning

confidence: 99%

Tribological glazing evolution of fixed abrasive pad under different polishing solution conditions

Tian,

Wu,

Pang

et al. 2023

ILT

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“…When the lapping slurry is alkaline, the complex reaction would be occurred between the triethanolamine added in slurry and the Cu 2+ ions, 26 , 27 and the detailed equations are shown as the equations (6) –( 9 ). If the concentration of triethanolamine in slurry is large, the chemical reaction of equation (6) will be easily occurred.…”

Section: Resultsmentioning

confidence: 99%

The effect of slurries on lapping performance of fixed abrasive pad for Si₃N₄ ceramics

et al. 2020

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In this paper, a series of experiments were carried out to explore the effect of slurry pH on materials removal rate (MRR) and surface quality in lapping of Si3N4 ceramics wafers with fixed abrasive pad (FAP) using different slurries with different pH. Then, the scanning electron microscope was employed to detect the microtopography and abrade smooth of FAP for exploring the effect of slurries pH on self-conditioning of pad. Experimental results demonstrated that the roughness of wafers increase with the increasing of slurry pH value. The surface of wafers is the best when the pH = 1 and the worst When the pH = 13. The MRR decreases firstly and then decreases with the increasing of the pH. The MRR reaches the lowest when slurry pH = 7, and reaches the highest when slurry pH = 13. These results further suggest that the soften layer of SiO2 could be formed due to the reactions between water and materials on wafer surface, which facilitates increasing material remove rate and improving the surface quality. The hydrogen ion and triethanolamine in slurry could react with the copper in fixed abrasive pad, which also could enhance the materials remove rate and affect the surface quality.

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“…Prior to nano-indentation and nano-scratching, all wafers should be lapped and polished to be ultra-smooth on both surfaces and damage-free. For high efficiency, a fixed abrasive pad [ 17 , 18 , 19 , 20 , 21 ] was adopted in lapping processing. Thereby, 50 wt.% of W14 diamond grits (grain size of 10–14 μm) were fixed into this lapping pad, and the slurry was the deionized water only mixed with 0.2% OP-10.…”

Section: Methodsmentioning

confidence: 99%

Effect of the Anisotropy Mechanical Properties on LN Crystals Fixed-Abrasive Lapping

et al. 2020

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The anisotropy of lithium niobate (LN) single crystals in mechanical properties affects its material removal uniformity during lapping. The nano-indentation hardness (HI) and elastic modulus(E) of Z-cut wafer and X-cut wafer were measured by a nano-indentation tester. The nano-scratching tests were adopted to evaluate its critical cutting depth (dc) of brittle ductile transition along crucial orientations of Z-cut and X-cut, respectively. A series of fixed-abrasive lapping tests were carried out to explore the effect of anisotropy on the lapping process. The results indicated that the HI of Z-cut was slightly higher than that of X-cut, while the E of Z-cut was about 1.1 times of the latter. The dc value of each orientation varies greatly. The lapping tests showed that the material removal rate (MRR) of Z-cut was lower than that of X-cut, for its high HI and E. Meanwhile, the surface quality of Z-cut was better than that of X-cut, for the larger dc of Z-cut. The research of mechanical properties of LN has guiding significance for its lapping process.

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Effect of chemical additive on fixed abrasive pad self-conditioning in CMP

Cited by 15 publications

References 19 publications

Tribological glazing evolution of fixed abrasive pad under different polishing solution conditions

Tribological glazing evolution of fixed abrasive pad under different polishing solution conditions

The effect of slurries on lapping performance of fixed abrasive pad for Si₃N₄ ceramics

Effect of the Anisotropy Mechanical Properties on LN Crystals Fixed-Abrasive Lapping

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Effect of chemical additive on fixed abrasive pad self-conditioning in CMP

Cited by 15 publications

References 19 publications

Tribological glazing evolution of fixed abrasive pad under different polishing solution conditions

Tribological glazing evolution of fixed abrasive pad under different polishing solution conditions

The effect of slurries on lapping performance of fixed abrasive pad for Si3N4 ceramics

Effect of the Anisotropy Mechanical Properties on LN Crystals Fixed-Abrasive Lapping

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Product

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The effect of slurries on lapping performance of fixed abrasive pad for Si₃N₄ ceramics