2016
DOI: 10.1016/j.tsf.2016.05.021
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Effect of bias on the structure and properties of TiZrN thin films deposited by unbalanced magnetron sputtering

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Cited by 27 publications
(7 citation statements)
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“…Further increasing the Mo content (26.14 atom %) led to TiAlMoN coating back to the columnar sharp (Figure 2e) corresponding to zone I in ASZM. 50 The AFM surface topography of all TiAlMoN coatings showed similar variation in particle shape as observed in SEM images. With increasing Mo content, a significant change in the topography of the TiAlMoN coatings was observed.…”
Section: Coating Morphology and Surface Topographysupporting
confidence: 58%
See 1 more Smart Citation
“…Further increasing the Mo content (26.14 atom %) led to TiAlMoN coating back to the columnar sharp (Figure 2e) corresponding to zone I in ASZM. 50 The AFM surface topography of all TiAlMoN coatings showed similar variation in particle shape as observed in SEM images. With increasing Mo content, a significant change in the topography of the TiAlMoN coatings was observed.…”
Section: Coating Morphology and Surface Topographysupporting
confidence: 58%
“…50 With the addition of Mo content in the TiAlMoN coatings, the columnar structure gradually disappeared and became denser at 16.09 atom % Mo (Figure 2b,c,d) corresponding to zone T in ASZM. 50 This is attributed to the highly packed (111) plane that has an important role in the densification of film growth.…”
Section: Coating Morphology and Surface Topographymentioning
confidence: 95%
“…TiZrN coating is characterized by a relatively high microhardness, with a change in the coefficient of linear expansion close to the ceramic under heating, which is essential when resisting thermal loads arising in the cutting zone [46,47]. Moreover, it is possible to predict a sufficiently high thermodynamic stability and resistance to the propagation of cracks during operation caused by the high binding energy in the crystal lattice of this coating.…”
Section: Deposition Of Vacuum-plasma Coatings On Ceramics and Coatingmentioning
confidence: 99%
“…Many methods used to grow nitride thin films had been reported such as chemical vapor deposition [18], magnetron sputtering [19][20][21] and pulsed laser deposition [22]. In this work, we fabricated ZrN x thin films by ion beam assisted deposition (IBAD).…”
Section: Introductionmentioning
confidence: 99%