Effect of asynchronous pulsing parameters on the structure and properties of CrAlN films deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS)

Lin, Jinn; Moore, John J.; Mishra, Brajendra; Pinkas, Malki; Sproul, William D.; Rees, J.A.

doi:10.1016/j.surfcoat.2007.06.068

Cited by 87 publications

(53 citation statements)

References 37 publications

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“…Al-enriched oxide layer and Al-N bonding have been observed to play a significant role in the oxidation resistance behavior and thermal stability of the coatings, respectively [42][43]. It has also been reported that an increase hardness of coatings may be due to the presence of AlN phase at the grain boundaries in conjunction with the high residual stress [17,[66][67][68][69]. The hardness of the CrN coatings increases with an increase of Al doping reaching to a maximum of 42.5 GPa at 28.5 at.%.…”

Section: Discussionmentioning

confidence: 99%

“…It is believed that the addition of Si changes the microstructures of the binary compounds from closely-packed columnar grains into nanocrystalline structures integrated in a Si 3 N 4 amorphous matrix [14][15]. Superhardness [17] has also been reported in CrN with a suitable amount of Aldoping. Al atoms are found to be segregated around the grain boundaries to form an amorphous AlN structure.…”

Section: Introductionmentioning

confidence: 99%

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Near-edge X-ray absorption fine structure studies of Cr1−xMxN coatings

Rahman

Duan

Jiang

et al. 2013

Journal of Alloys and Compounds

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Near-edge X-ray absorption fine structure studies of Cr 1-x M x N coatings, (2013), doi: http://dx.doi.org/10. 1016/ j.jallcom.2013.06.021 This is a PDF file of an unedited manuscript that has been accepted for publication. As a service to our customers we are providing this early version of the manuscript. The manuscript will undergo copyediting, typesetting, and review of the resulting proof before it is published in its final form. Please note that during the production process errors may be discovered which could affect the content, and all legal disclaimers that apply to the journal pertain. AbstractCr 1-x M x N coatings, with doping concentrations (Si or Al) varying from 14.3 to 28.5 at.%, were prepared on AISI M2 tool steel substrates using a TEER UDP 650/4 closed field unbalanced magnetron sputtering system. Near-edge X-ray absorption fine structure (NEXAFS) characterization was carried out to measure the aluminum and silicon Kedges, as well as chromium L-edge, in the coatings. Two soft X-ray techniques, Auger electron yield (AEY) and total fluorescence yield (TFY), were employed to investigate the surface and inner structural properties of the materials in order to understand the structural evolution of CrN matrix with addition of Al (or Si) elements. Investigations on the local bonding states and grain boundaries of the coatings, using NEXAFS technique, provide significant information which facilitates understanding of the local electronic 2 structure of the atoms and shed light on the origins of the high mechanical strength and oxidation resistance of these technologically important coatings.

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Section: Discussionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Near-edge X-ray absorption fine structure studies of Cr1−xMxN coatings

Rahman

Duan

Jiang

et al. 2013

Journal of Alloys and Compounds

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“…CrAlN films exhibit high hardness and their properties are greatly affected by sputtering conditions and pulsing parameters. [8][9][10][11][12][13][14] The problem is that in each deposition process there are many deposition parameters, which operates simultaneously and can form different structures. Previous reports demonstrated that ion energy and ion flux enhance in the plasma, with increasing pulse width in Unbalanced Magnetron Sputtering system.…”

Section: Introductionmentioning

confidence: 99%

“…Previous reports demonstrated that ion energy and ion flux enhance in the plasma, with increasing pulse width in Unbalanced Magnetron Sputtering system. 8,9) Ions energy and flux consequently change the CrAlN film structure and properties. 8,9) In spite of intensive research on the preparation of hard CrAlN films there are only a few reports on the relationship between pulsing parameters, microstructure and hardness of these hard films in a Balanced Magnetron Sputtering system.…”

Section: Introductionmentioning

confidence: 99%

“…8,9) Ions energy and flux consequently change the CrAlN film structure and properties. 8,9) In spite of intensive research on the preparation of hard CrAlN films there are only a few reports on the relationship between pulsing parameters, microstructure and hardness of these hard films in a Balanced Magnetron Sputtering system. The aim of this study is to investigate the effect of pulse width on the microstructure of CrAlN films and their mechanical properties when prepared in a Balanced Magnetron Sputtering system.…”

Section: Introductionmentioning

confidence: 99%

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Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System

et al. 2008

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CrAlN films have been prepared using a pulsed DC reactive sputtering in FTS system with Cr/Al alloy (¼ 50=50 at%) targets in a mixed atmosphere of Ar and N 2 . The effects of pulse width on the film structure and properties have been investigated. XRD analyses were carried out to determine the phases and texture of the films. Transmission electron microscopy studies were carried out for selected films. In order to investigate the relationship between the mechanical properties and microstructure of the films, the hardness was measured by a nanoindentation system. Films prepared at lower pulse widths, exhibited fcc-CrN structure. In contrast, films that were prepared at higher pulse widths showed a mixed structure of hcp-AlN, hcp-Cr 2 N and a small amount of fcc-CrN phases. Plastic hardness, H pl , of the films ranged between 32 to 41 GPa while the Young's modulus, E IT , of the films ranged from 320 to 340 GPa. Increasing the pulse width also resulted in an increase in the film's internal stress. In addition, the grain size of the samples decreased with increasing pulse width.Consequently, the film deposited at higher pulse width exhibited high hardness of 41 GPa, H 3 =E 2 ratio of $0:6 and relatively lower internal stress of À3:5 Gpa. These results indicated that changing the pulse width can strongly affect structure and properties of CrAlN films, resulting in a good combination of mechanical and tribological properties, under proper conditions in a pulsed DC Balanced Magnetron Sputtering system.

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The effect of sputtering parameters and doping on the properties of CrN‐based coatings—A critical review

Tiwari,

Rao,

Kharb

et al. 2024

Surface & Interface Analysis

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Chromium‐based coatings have been of interest to researchers for the last two decades because of their extraordinary properties like high hardness, high wear, and corrosion resistance properties. However, it is in practice and research to increase the properties of Cr‐based coatings for high‐temperature applications. Numerous dopants like silicon (Si), titanium (Ti), vanadium (V), aluminum (Al), and zirconium (Zr) have been used together with Cr to achieve enhanced properties. The plasma‐based sputtering process is one of the popular and reliable techniques to deposit thin film coatings. The substrate material, processed gas and pressure, substrate temperature, film thickness, and so on also play a significant role in varying the properties and microstructure of the deposited film. Several researchers have deposited Cr/CrN‐based thin films via the chemical vapor deposition technique (CVD) and physical vapor deposition technique (PVD) to study their properties and behavior at room temperature as well as for high‐temperature applications. This work reflects the review of work done to deposit Cr/CrN‐based coatings deposited via PVD: more specifically sputtering technique. The effect of doping in the CrN matrix and variation in sputtering parameters on the properties of CrN‐based coatings have also been studied.

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Effect of asynchronous pulsing parameters on the structure and properties of CrAlN films deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS)

Cited by 87 publications

References 37 publications

Near-edge X-ray absorption fine structure studies of Cr1−xMxN coatings

Near-edge X-ray absorption fine structure studies of Cr1−xMxN coatings

Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System

The effect of sputtering parameters and doping on the properties of CrN‐based coatings—A critical review

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