Effect of argon addition on CH4-H2 microwave plasma: Self-consistent simulation and nanodiamond coating deposition

Yang, Zhiliang; Guo, Zhijian; An, Kang; Liu, Yuchen; Wang, Yunkai; Wei, Junjun; Liu, Jinlong; Chen, Liangxian; Ouyang, Xiaoping; Li, Chengming

doi:10.1016/j.surfcoat.2024.131165

Surface and Coatings Technology

2024

DOI: 10.1016/j.surfcoat.2024.131165

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Effect of argon addition on CH4-H2 microwave plasma: Self-consistent simulation and nanodiamond coating deposition

Zhiliang Yang,

Zhijian Guo,

Kang An

et al.

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Effect of argon addition on CH4-H2 microwave plasma: Self-consistent simulation and nanodiamond coating deposition

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References 49 publications

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