Effect of Applied Current Density on Morphological and Structural Properties of Electrodeposited Fe–Cu Films

Saraç, Umut; Baykul, M. Celalettin

doi:10.1016/s1005-0302(12)60165-0

Cited by 16 publications

(14 citation statements)

References 33 publications

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“…Thus, in the present study, it is concluded that the Fe-Cu films electrodeposited onto ITO coated glass substrates from the electrolytes with low and high Fe ion concentrations consist of a mixture of fcc Cu and bcc Fe particles with respect to their Fe content. These results obtained about our electrodeposited Fe-Cu films are in good agreement with the results found in previous published papers [12,13,20]. On the other hand, it is found from the XRD patterns given in Figure 2 that the relative intensity of bcc Fe (110) diffraction peak increases with the Fe ion concentration in the electrolyte.…”

Section: Resultssupporting

confidence: 93%

“…Thus, a decrease in the current density towards more negative values with the Fe ion concentration in the electrolyte leads to Fe-Cu film with higher Fe : Cu ratio. It has been shown that the Fe-Cu films are Ferich as the films are produced at more negative current densities [13]. On the other hand, the ratio of Fe : Cu within the films is found to be lower than the ion concentration ratio of Fe +2 : Cu +2 in the electrolyte.…”

Section: Resultsmentioning

confidence: 99%

“…As seen in Figure 1, the current density decreased towards more negative values as the Fe ion concentration within the electrolyte increased. Thus, it is expected that a decrement of the current density towards more negative values observed at high Fe ion concentration increases the nucleation densities and consequently reduces the crystallite size [13,[22][23][24][25].…”

Section: Resultsmentioning

confidence: 99%

“…It has been shown that the composition of electrolyte is one of the most important growth parameters affecting strongly the properties of the electrodeposited thin film materials deposited onto indium tin oxide (ITO) coated glass substrates [9][10][11]. In previous works, we investigated the properties of electrodeposited Fe-Cu films grown onto ITO coated glass substrates at different electrolyte temperatures and current densities [12,13]. However, the effect of Fe : Cu ratio caused by the change of Fe ion concentration in the electrolyte on the structural and morphological properties of Fe-Cu films prepared onto ITO coated glass substrates has not been reported.…”

Section: Introductionmentioning

confidence: 99%

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Comparison of Microstructural and Morphological Properties of Electrodeposited Fe-Cu Thin Films with Low and High Fe : Cu Ratio

Saraç

Baykul²

2013

Advances in Materials Science and Engineering

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Fe-Cu films with low and high Fe : Cu ratio have been produced from the electrolytes with different Fe ion concentrations at a constant deposition potential of −1400 mV versus saturated calomel electrode (SCE) by electrodeposition technique onto indium tin oxide (ITO) coated conducting glass substrates. It was observed that the variation of Fe ion concentration in the electrolyte had a very strong influence on the compositional, surface morphological, and microstructural properties of the Fe-Cu films. An increase in the Fe ion concentration within the plating bath increased the Fe content, consequently Fe : Cu ratio within the films. The crystallographic structure analysis showed that the Fe-Cu films had a mixture of face-centered cubic (fcc) Cu and body centered cubic (bcc)α-Fe phases. The average crystallite size decreased with the Fe ion concentration. The film electrodeposited from the electrolyte with low Fe ion concentration exhibited a morphology consisting of dendritic structures. However, the film morphology changed from dendritic structure to cauliflower-like structure at high Fe ion concentration. The surface roughness and grain size were found to decrease significantly with increasing Fe ion concentration in the electrolyte. The significant differences observed in the microstructural and morphological properties caused by the change of Fe ion concentration in the electrolyte were ascribed to the change of Fe : Cu ratio within the films.

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Section: Resultssupporting

confidence: 93%

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Comparison of Microstructural and Morphological Properties of Electrodeposited Fe-Cu Thin Films with Low and High Fe : Cu Ratio

Saraç

Baykul²

2013

Advances in Materials Science and Engineering

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“…The increase of crystallite size with the increase of the applied current density was also observed in recent studies [20,21]. It is known that applied current has a significant effect on the crystalline structure and grain size of coated layers [22]. However, determination of this effect on the grain size of coatings is a very complex problem because of complexity of the electrodeposition mechanism.…”

Section: Resultssupporting

confidence: 64%

Effect of the Applied Current Density on the Structural and Magnetic Properties of the Electrodeposited Cobalt-Nickel Alloy Thin Films

Özdemir

2017

Acta Phys. Pol. A

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In this study, cobalt-nickel (Co-Ni) alloys were deposited electrochemically onto aluminum substrates under applied current densities of 103.8, 138.4, 173 and 207.6 A m −2 . Influence of the applied current density on the structural and magnetic properties of the Co-Ni alloys was investigated. The bath for Co-Ni alloys deposition was composed of 0.08 mol l −1 CoSO4·7H2O, 0.2 mol l −1 NiCl2·6H2O, 0.1 mol l −1 NiSO4·6H2O and 0.25 mol l −1 H3BO3. The electrochemical investigation of Co-Ni alloys was completed using cyclic voltammetry and galvanostatic studies. Inductively coupled plasma analysis has shown that the amount of the cobalt in the deposited alloy has decreased from 73.61% to 67.01% with the increase of the applied current density from 103.8 to 207.6 A m −2 . According to the magnetic analysis results, the values of coercivity coefficient of the deposited Co-Ni alloys range between 115 and 150 Oe, confirming ferromagnetic behavior of the alloys. Experiment results indicate that magnetic and structural properties of the Co-Ni alloy deposits are greatly influenced by the applied current density in the electrodeposition system.

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Tuning structural properties, morphology and magnetic characteristics of nanostructured Ni‐Co‐Fe/ITO ternary alloys by galvanostatic pretreatment process

Saraç

Trong

Baykul

et al. 2022

Microscopy Res & Technique

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In this research, the structural properties, surface morphology, and magnetic characteristics of nanostructured ternary ferromagnetic alloys grown by a cost‐effective and effortless two‐step electrochemical deposition method on indium tin oxide (ITO) substrates with and without a galvanostatic pretreatment process (GPP) were examined. The GPP was applied at various pretreatment current densities (PCDs) such as −10, −20, and − 30 mA/cm2. The effect of the PCD on the Ni, Co, and Fe contents is found to be insignificant and all resultant Ni‐Co‐Fe thin films show an abnormal co‐deposition. The films have nano‐sized crystallites ranging from 17.3 to 19.6 nm and showed a face‐centered cubic structure with the [111] preferential growth. Compared to the non‐GPP applied Ni‐Co‐Fe film, growing the ternary Ni‐Co‐Fe film on ITO at the PCD of −30 mA/cm2 causes an improvement in the crystal quality and a reduction in the particle size from 150 ± 50 to 70 ± 20 nm. A decrement in the surface roughness and coercivity was also achieved by applying the GPP at the PCD of −30 mA/cm2, but the opposite is true for the GPP performed at the PCD of −10 mA/cm2. The GPP has an effect on the magnetic Squareness Ratio (SQR), but the influence of the PCD on the SQR parameter is negligible. The obtained findings reveal that the properties of the Ni‐Co‐Fe/ITO ternary alloys can be tuned through the GPP applied in various PCDs. Highlights • The effect of the PCD on the Ni, Co, and Fe contents is found to be insignificant. • The films have nano‐sized crystallites and showed a face‐centered cubic structure with the [111] preferential growth. • The analysis reveals that the GPP changes the crystal quality, Hc parameter, surface roughness, and particle size of the films. • The GPP has an effect on the magnetic squareness ratio (SQR), but the influence of the PCD on the SQR parameter is negligible. • The films had nano‐sized crystallites ranging from 17.3 to 19.6 nm. • The films were ferromagnetic, and the Hc and SQR parameters of the films ranged from 30.2 to 42.7 Oe and from 8.8% to 19.6%.

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Effect of Applied Current Density on Morphological and Structural Properties of Electrodeposited Fe–Cu Films

Cited by 16 publications

References 33 publications

Comparison of Microstructural and Morphological Properties of Electrodeposited Fe-Cu Thin Films with Low and High Fe : Cu Ratio

Comparison of Microstructural and Morphological Properties of Electrodeposited Fe-Cu Thin Films with Low and High Fe : Cu Ratio

Effect of the Applied Current Density on the Structural and Magnetic Properties of the Electrodeposited Cobalt-Nickel Alloy Thin Films

Tuning structural properties, morphology and magnetic characteristics of nanostructured Ni‐Co‐Fe/ITO ternary alloys by galvanostatic pretreatment process

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