Effect of annealing temperature on the structure and dielectric characterization of ITO thin films on a boro-float substrate prepared by radio frequency sputtering

Hakamy, A.; Mebed, A. M.; Sedky, A.; Abd-Elnaiem, Alaa M.

doi:10.1007/s10832-024-00348-y

J Electroceram

2024

DOI: 10.1007/s10832-024-00348-y

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Effect of annealing temperature on the structure and dielectric characterization of ITO thin films on a boro-float substrate prepared by radio frequency sputtering

A. Hakamy,

A. M. Mebed,

A. Sedky

et al.

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Effect of annealing temperature on the structure and dielectric characterization of ITO thin films on a boro-float substrate prepared by radio frequency sputtering

Cited by 0 publications

References 47 publications

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