Effect of annealing on the properties of HfO2-Al2O3 mixture coatings for picosecond laser applications

Shi, Jun; Zhu, Meiping; Du, Wenjuan; Liu, Tianbao; Li, Zhou; Jiang, Youen; Shao, Jianda

doi:10.1016/j.apsusc.2021.152192

Cited by 12 publications

(3 citation statements)

References 47 publications

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“…The measured XRD spectra of the four PLBS coatings are shown in Figure 3(b). Except for two broad peaks corresponding to the fused silica substrate and HfO 2 phase, no other sharp peaks are observed, indicating that all HfO 2 –Al 2 O 3 mixture coatings are amorphous [ 26 , 27 ] . The coating stresses of the PLBS coatings measured after deposition (with an aging time of 45 days) are shown in Figure 3(c), and all coatings exhibit compressive stress.…”

Section: Resultsmentioning

confidence: 99%

Effect of subsurface impurity defects on laser damage resistance of beam splitter coatings

Zhu

Shi

et al. 2023

High Pow Laser Sci Eng

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The laser-induced damage threshold (LIDT) of plate laser beam splitter (PLBS) coatings is closely related to the subsurface absorption defects of the substrate. Herein, a two-step deposition temperature method is proposed to understand the effect of substrate subsurface impurity defects on the LIDT of PLBS coatings. Firstly, BK7 substrates are heat-treated at three different temperatures. The surface morphology and subsurface impurity defect distribution of the substrate before and after the heat treatment are compared. Then, a PLBS coating consisting of alternating HfO2–Al2O3 mixture and SiO2 layers is designed to achieve a beam-splitting ratio (transmittance to reflectance, s-polarized light) of approximately 50:50 at 1053 nm and an angle of incidence of 45°, and it is prepared under four different deposition processes. The experimental and simulation results show that the subsurface impurity defects of the substrate migrate to the surface and accumulate on the surface during the heat treatment, and become absorption defect sources or nodule defect seeds in the coating, reducing the LIDT of the coating. The higher the heat treatment temperature, the more evident the migration and accumulation of impurity defects. A lower deposition temperature (at which the coating can be fully oxidized) helps to improve the LIDT of the PLBS coating. When the deposition temperature is 140°C, the LIDT (s-polarized light, wavelength: 1064 nm, pulse width: 9 ns, incident angle: 45°) of the PLBS coating is 26.2 J/cm2, which is approximately 6.7 times that of the PLBS coating deposited at 200°C. We believe that the investigation into the laser damage mechanism of PLBS coatings will help to improve the LIDT of coatings with partial or high transmittance at laser wavelengths.

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Section: Resultsmentioning

confidence: 99%

Effect of subsurface impurity defects on laser damage resistance of beam splitter coatings

Zhu

Shi

et al. 2023

High Pow Laser Sci Eng

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“…Defects can be generally classified into three categories based on their location: intralayer defects, substrate-layer interface defects, and layer-layer interface defects. Much work has been done to minimize intralayer defects in laser thin films, − while research on substrate-layer interface defects and layer-layer interface defects is relatively limited, partly due to difficulties in characterization . Fortunately, interface defects often lead to changes in trap density and charge state, − allowing the interface defect density to be studied with the help of capacitance–voltage (C–V) measurements.…”

Section: Introductionmentioning

confidence: 99%

Comparative Study of Plasma-Enhanced-Atomic-Layer-Deposited Al₂O₃/HfO₂/SiO₂ and HfO₂/Al₂O₃/SiO₂ Trilayers for Ultraviolet Laser Applications

Lin,

Song,

Liu

et al. 2024

ACS Appl. Mater. Interfaces

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High-performance thin films combining large optical bandgap Al 2 O 3 and high refractive index HfO 2 are excellent components for constructing the next generation of laser systems with enhanced output power. However, the growth of low-defect plasma-enhanced-atomic-layer-deposited (PEALD) Al 2 O 3 for highpower laser applications and its combination with HfO 2 and SiO 2 materials commonly used in high-power laser thin films still face challenges, such as how to minimize defects, especially interface defects. In this work, substrate-layer interface defects in Al 2 O 3 single-layer thin films, layer-layer interface defects in Al 2 O 3 -based bilayer and trilayer thin films, and their effects on the laser-induced damage threshold (LIDT) were investigated via capacitance− voltage (C−V) measurements. The experimental results show that by optimizing the deposition parameters, specifically the deposition temperature, precursor exposure time, and plasma oxygen exposure time, Al 2 O 3 thin films with low defect density and high LIDT can be obtained. Two trilayer anti-reflection (AR) thin film structures, Al 2 O 3 /HfO 2 /SiO 2 and HfO 2 /Al 2 O 3 /SiO 2 , were then prepared and compared. The trilayer AR thin film with Al 2 O 3 / HfO 2 /SiO 2 structure exhibits a lower interface defect density, better interface bonding performance, and an increase in LIDT by approximately 2.8 times. We believe these results provide guidance for the control of interface defects and the design of thin film structures and will benefit many thin film optics for laser applications. KEYWORDS: plasma-enhanced atomic layer deposition, Al 2 O 3 single-layer thin film, Al 2 O 3 /HfO 2 /SiO 2 trilayer, laser-induced damage threshold, interface defect, interface bonding performance

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“…Recently, hafnium (Hf)which belongs to the same group as titanium and zirconiumhas been receiving increasing attention. Hafnium dioxide (HfO 2 ), the primary oxide of Hf, is commonly used in optical coatings, refractory materials, and catalysts. − At a nanoscale, HfO 2 displays improved properties, such as an enlarged surface area and increased catalytic activity. − In this study, a fluorine-containing organic ligand, tetrafluoroterephthalic acid, was used to synthesize the metal–organic framework (MOF) material UiO-66(Hf). This material was subsequently calcined to obtain HfO 2 .…”

Section: Introductionmentioning

confidence: 99%

Signal “On-Amplified-Off” Strategy Based on Hafnium Dioxide Nanomaterials as Electrochemiluminescence Emitters for Progesterone Detection

Dong,

Zeng,

Dai

et al. 2023

Anal. Chem.

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When consumed, excess progesterone (P4)found in food and the environmentcan lead to severe illnesses in humans. Therefore, quantitative analysis of P4 is critical for identifying its hazardous levels. In this study, a novel signal “on-amplified-off” P4 detection mode was proposed, which was based on the utilization of hafnium oxide (HfO2) as a unique electrochemiluminescence (ECL) emitter, produced by calcining UiO-66(Hf). This is the first time that HfO2 has been used as an ECL emitter. HfO2 displayed excellent conductivity and a high specific surface area, allowing it to connect with numerous aptamers and produce a “signal-on” effect. Ni-doped ZnO (Ni-ZnO) acted as a coreaction accelerator, enhancing the ECL strength of HfO2 by generating more tripropylamine radicals. cDNA was labeled with Ni-ZnO, and Ni-ZnO was linked to the aptamer via base complementary pairing, affording “signal-amplified”. The presence of the target molecule P4 instigated a specific binding process with the aptamer, triggering the shedding of cDNA-Ni-ZnO and resulting in “signal-off”. This novel “on-amplified-off” strategy effectively improved the sensitivity and specificity of P4 analysis, introducing a practical method for detecting biomolecules beyond the scope of this study, which holds immense potential for future applications.

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Effect of annealing on the properties of HfO2-Al2O3 mixture coatings for picosecond laser applications

Cited by 12 publications

References 47 publications

Effect of subsurface impurity defects on laser damage resistance of beam splitter coatings

Effect of subsurface impurity defects on laser damage resistance of beam splitter coatings

Comparative Study of Plasma-Enhanced-Atomic-Layer-Deposited Al₂O₃/HfO₂/SiO₂ and HfO₂/Al₂O₃/SiO₂ Trilayers for Ultraviolet Laser Applications

Signal “On-Amplified-Off” Strategy Based on Hafnium Dioxide Nanomaterials as Electrochemiluminescence Emitters for Progesterone Detection

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Effect of annealing on the properties of HfO2-Al2O3 mixture coatings for picosecond laser applications

Cited by 12 publications

References 47 publications

Effect of subsurface impurity defects on laser damage resistance of beam splitter coatings

Effect of subsurface impurity defects on laser damage resistance of beam splitter coatings

Comparative Study of Plasma-Enhanced-Atomic-Layer-Deposited Al2O3/HfO2/SiO2 and HfO2/Al2O3/SiO2 Trilayers for Ultraviolet Laser Applications

Signal “On-Amplified-Off” Strategy Based on Hafnium Dioxide Nanomaterials as Electrochemiluminescence Emitters for Progesterone Detection

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Comparative Study of Plasma-Enhanced-Atomic-Layer-Deposited Al₂O₃/HfO₂/SiO₂ and HfO₂/Al₂O₃/SiO₂ Trilayers for Ultraviolet Laser Applications