2002
DOI: 10.1063/1.1506191
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Effect of annealing on formation of self-assembled (In,Ga)As quantum wires on GaAs (100) by molecular beam epitaxy

Abstract: The role of annealing for ͑In,Ga͒As self-organized quantum wire ͑QWR͒ formation on GaAs ͑100͒ during growth of ͑In,Ga͒As/GaAs superlattice ͑SL͒ structures is studied by x-ray diffraction ͑XRD͒, atomic force microscopy ͑AFM͒, and photoluminescence ͑PL͒ spectroscopy. XRD and AFM evidence that annealing after the supply of each layer of elongated ͑In,Ga͒As quantum dots ͑QDs͒ in the SL is the crucial process for QWR formation. We conclude that during annealing, the shape anisotropy of the QDs is enhanced due to an… Show more

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Cited by 28 publications
(15 citation statements)
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“…The length of the arrays easily exceeds 3 m with a lateral periodicity of 140 nm, which agrees with the QWR periodicity determined from x-ray diffraction. 4 The ordering of the InAs QDs and, hence, the uniformity of the QWR template, improves with increasing number of SL periods, generating a well-defined lateral strain field modulation at the GaAs surface with sufficiently deep minima. Single InAs QDs are formed on this QWR template for reduced InAs thickness of 1.5 ML and a very low growth rate of 0.0007 nm/s.…”
Section: 5mentioning
confidence: 99%
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“…The length of the arrays easily exceeds 3 m with a lateral periodicity of 140 nm, which agrees with the QWR periodicity determined from x-ray diffraction. 4 The ordering of the InAs QDs and, hence, the uniformity of the QWR template, improves with increasing number of SL periods, generating a well-defined lateral strain field modulation at the GaAs surface with sufficiently deep minima. Single InAs QDs are formed on this QWR template for reduced InAs thickness of 1.5 ML and a very low growth rate of 0.0007 nm/s.…”
Section: 5mentioning
confidence: 99%
“…The high-energy shift is due to the In desorption during template formation which is independently confirmed by x-ray diffraction. 4,5 When the PL of the QWR template vanishes around 100 K, the PL intensity of the QD arrays slightly increases ͓Fig. 9͑a͔͒, indicating thermally activated carrier transfer from the QWRs to the QDs.…”
Section: ϫ2mentioning
confidence: 99%
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“…10,15,16 The former causes the QWRs to be well-separated and the latter causes the QWRs to be uniform along their length. Hence, since the lateral periodicities of the QD arrays in the top, bottom, and slope areas are similar on the ͓0−11͔ mesas, it is evident that the generated type-A steps (parallel to ͓0−11͔) do not affect the strain-gradient-driven In migration along [011].…”
mentioning
confidence: 99%
“…5,6 Artificial patterning techniques, however, often introduce defects and irregularities in the QDs given by the spatial resolution of the lithography and etching steps which degrade the electronic and optical qualities. Recently we have introduced a concept for the lateral ordering of InGaAs QDs in linear arrays on planar GaAs ͑100͒ substrates by molecular beam epitaxy 7,8 and planar InP ͑100͒ substrates by chemical beam epitaxy ͑CBE͒, 9 on which we concentrate here. Based on anisotropic adatom surface migration and lateral and vertical strain correlations, wirelike InAs nanostructures are created during growth of an InAs/ InGaAsP superlattice ͑SL͒, which acts as a template for the formation of linear InAs QD arrays due to local strain field recognition.…”
mentioning
confidence: 99%