2023
DOI: 10.3390/ma16062392
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Effect of Al Concentration on Structural, Optical and Electrical Properties of (Gd, Al) Co-Doped ZnO and Its n-ZnO/p-Si (1 0 0) Heterojunction Structures Prepared via Co-Sputtering Method

Abstract: Heterojunction structures of n-ZnO/p-Si were prepared through the growth of undoped ZnO and (Gd, Al) co-doped ZnO films onto p-type Si (1 0 0) substrates, using a co-sputtering method. The structural and optical properties of the Gd-doped ZnO films were studied as a function of different Al doping concentrations. The X-ray diffraction profiles indicated that the films had a nanocrystalline structure of ZnO with a (0 0 2) preferential orientation. An increase in the Al doping concentration deteriorated the (0 0… Show more

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Cited by 9 publications
(5 citation statements)
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“…This can also be explained by the fact that at low doping concentrations, In 3+ is rapidly and mostly solidified into the ZnO lattice, but the solidification is limited by the fact that the ionic radius of In 3+ (ion radius of 8.0 × 10 −11 m) is larger than that of Zn 2+ (ion radius of 7.4 × 10 −11 m), and thus the diffraction angles of the three strongest peaks are almost the same at doping ratios of 0.6%, 0.8%, and 1.0%. At the same time, this also confirms the theory that "larger ion doping will move the XRD diffraction peaks to a lower diffraction angle, while smaller radius ion doping will move the corresponding diffraction peaks to a higher diffraction angle" [32,34]. This peak shift indirectly reflects the solid solution of In 3+ ions in ZnO grains.…”
Section: Resultssupporting
confidence: 80%
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“…This can also be explained by the fact that at low doping concentrations, In 3+ is rapidly and mostly solidified into the ZnO lattice, but the solidification is limited by the fact that the ionic radius of In 3+ (ion radius of 8.0 × 10 −11 m) is larger than that of Zn 2+ (ion radius of 7.4 × 10 −11 m), and thus the diffraction angles of the three strongest peaks are almost the same at doping ratios of 0.6%, 0.8%, and 1.0%. At the same time, this also confirms the theory that "larger ion doping will move the XRD diffraction peaks to a lower diffraction angle, while smaller radius ion doping will move the corresponding diffraction peaks to a higher diffraction angle" [32,34]. This peak shift indirectly reflects the solid solution of In 3+ ions in ZnO grains.…”
Section: Resultssupporting
confidence: 80%
“…This slight decrease in lattice parameter values. This is due to the presence of small stresses in the ZnO structure, which leads to the enlargement of the single cell of the ZnO lattice [ 32 ]. This can also be explained by the fact that at low doping concentrations [ 33 ], In 3+ is rapidly and mostly solidified into the ZnO lattice, but the solidification is limited by the fact that the ionic radius of In 3+ (ion radius of 8.0 × 10 −11 m) is larger than that of Zn 2+ (ion radius of 7.4 × 10 −11 m), and thus the diffraction angles of the three strongest peaks are almost the same at doping ratios of 0.6%, 0.8%, and 1.0%.…”
Section: Resultsmentioning
confidence: 99%
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“…The photocatalytic efficiency of semiconductor materials depends on various factors such as particle size, morphology, surface area, crystalline structure, and the presence of defects [ 16 , 95 , 96 , 97 ]. Apart from these factors, the recombination rate of photogenerated charges can impact the photocatalytic process.…”
Section: Resultsmentioning
confidence: 99%
“…In addition, the results indicate that the Er-doped ZnO-based photocatalyst promotes charge separation, improving photocatalytic efficiency. The photocatalytic efficiency of semiconductor materials depends on various factors such as particle size, morphology, surface area, crystalline structure, and the presence of defects [16,[95][96][97]. Apart from these factors, the recombination rate of photogenerated charges can impact the photocatalytic process.…”
Section: Morphological and Textural Changes Induced By The Er 3+ Ions...mentioning
confidence: 99%