Effect of Additives on Optical Measurements of NiSe2 Thin Films

Abstract

Nickel selenide, NiSe 2 is one of the absorbent materials used in thin film technology in photoelectrochemical (PEC) cell. Electrodeposition is a preferred method to produce NiSe 2 thin films due to its advantages such as the possibility of large scale production, minimum waste of components, easy monitoring of deposition process and large area deposition.Ethylenediaminetetraacetic acid (EDTA) and triethanolamine (TEA) were employed as the additives during the deposition. The samples were deposited within 30 minutes deposition time according to potential acquired from cyclic voltammetry measurements. Thin film thickness measurements, structural studies, optical studies, morphological and compositional analysis as well as Mott-Schottky measurements were carried out. .

Structural studies of NiTe2 thin films with the influence of amino additives

“…The temperature was controlled to 40°C ± 2°C (Anand et al 2013b). The first lower peak and subsequent upper peak of cyclic voltammograms represent the reduction and oxidation processes of the ions in electrolyte respectively.…”

“…The effect of additive concentration had been studied by varying the concentration of both EDTA and TEA with optimum deposition potential and time as described in Table 2. To observe the crystal structure of the thin film, X-ray diffraction (XRD) analysis has been done by using PANalytical XPERT PROMPD PW 3040/60 diffractometer (Almelo, The Netherlands) using monochromatic Cu K α radiation (λ = 1.5418 Ǻ) at 2θ angles in the range of 0°t o 90° (Anand et al 2013b). …”

“…The use of additives in thin film syntheses has been implemented where hexagonal NiTe 2 Sources: Aricò et al 1997;Saloniemi et al 1998;Takahashi et al 1994. Table 2 The tabulation of additive concentration nanoplates have been synthesised through an ethylenediaminetetracetic acid (EDTA)-assisted hydrothermal reaction and NiSe 2 thin films have been obtained via triethanolamine (TEA)-assisted electrodeposition techniques (Liu et al 2009;Anand et al 2013b). In this paper, the preparation of NiTe 2 thin films by the electrodeposition technique has been presented in different electrolyte conditions, deposition potential and deposition time with the use of both TEA and EDTA additives, separately.…”

Structural and Optical Properties of Nickel Sulfoselenide (NiSSe) Thin Film for Photoelectrochemical Applications

“…Transition metal chalcogenide are materials of semiconductors, which are capable to be used as an efficient photovoltaic material [2][3][4]. From the previous research, transition metal chalcogenides NiX2 (X= Se, S and Te) and MoX2 (X=Se, S and Te) have been showing a good result in term of optical and semiconducting properties as a new thin film material for solar energy in effort to replace the conventional method [5][6][7][8][9][10]. Transition metal chalcogenide thin films preparation by electrochemical methods is attracting to be given a special attention as it is relatively affordable, simple and convenient for large area deposition [5].…”

“…Good quality films can be potentially produced by changing the deposition parameters; for example bath temperature, pH of the bath, concentration of the solution and deposition time. The thin films are prepared on conducting tin oxide coated glass substrates as well as silicon and metal substrates [6][7][8][9][10].…”