Effect of Active Dithiocarbamate Derivatives on Copper Nano Film Deposition

Abstract

Objective:The coordination and electrochemistry-related effects and uses of piperidine dithiocarbamate (pipdtc) and piperazine dithiocarbamate (pzdtc) are the main topics of this article. Method: An environment friendly electroless bath was created using a very small amount of biodegradable methanesulphonic bronsted acid, Glyoxylic acid as a reducing agent, Xylitol as a non-toxic natural polyhydroxylic complexing agent and potassium hydroxide as pH modifier. Compact and finer deposits were obtained at pH 13.0 and 45 • C with an addition of 1 ppm of pipdtc and pzdtc in an optimized bath. Findings: The inhibiting effect of pipdtc and pzdtc additives depends on deposit properties, throwing power, thickness uniformity, surface tension and grain structure management. Novelty: In this electroless copper plating method, pipdtc and pzdtc improved the physical properties and produced quality deposits. Gravimetric and weight gain calculations were used to determine the physical parameters. AFM experiments were used to describe the surface morphologies of copper deposits. By using X-ray diffractogram (XRD) analysis, the copper deposits' crystallite sizes were quantified, and cyclic voltammetry analysis was used to assess their quality.