ECV Profiling of Ultra-Shallow Junction Formed by Plasma Doping

Wu, Huizhen; Ru, Guo-Ping; Jin, C.G.; Mizuno, B.; Jiang, Yu-Long; Qu, Xin-Ping; Li, Bing‐Zong

doi:10.1109/iwjt.2006.220875

2006 International Workshop on Junction Technology 2006

DOI: 10.1109/iwjt.2006.220875

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ECV Profiling of Ultra-Shallow Junction Formed by Plasma Doping

Huizhen Wu

Guo-Ping Ru

C.G. Jin³

et al.

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ECV Profiling of Ultra-Shallow Junction Formed by Plasma Doping

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