Early phase laser induced plasma diagnostics and mass removal during single-pulse laser ablation of silicon

Liu, H.C.; Mao, Xianglei; Yoo, Jae‐Hyuck; Russo, Richard E.

doi:10.1016/s0584-8547(99)00092-0

Cited by 186 publications

(179 citation statements)

References 25 publications

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“…The calculated values of α and γ are within experimental error to the values obtained by Liu, et al [9]. The calculated dimensionality 1.30 supports preferential spatial expansion in the direction perpendicular to the target.…”

supporting

confidence: 84%

“…Under the assumption of local thermal equilibrium (LTE), the plasma temperature T (in K) can be determined by the relative line-to-continuum intensity ratio using the following expression [6][7][8], where is the continuum emission coefficient; ε is the integrated emission coefficient over the line spectral profile. The parameters used for T c ε l e and n e calculations can be found in reference [9].…”

mentioning

confidence: 99%

“…After the plasma is significantly ionized, electronion inverse bremsstrahlung dominates the absorption. Given the laser wavelength and plasma density measured, the absorption coefficient for electron-ion inverse bremsstrahlung was estimated to be ~1 cm -1 at time of 3 ns for the aspect ratio ~3 cavity [9]. The absorbed energy is converted into internal energy of the plasma.…”

mentioning

confidence: 99%

“…For an adiabatic expansion, the expressions for plasma temperature and electron number density as a function of time are [9] T and ,…”

mentioning

confidence: 99%

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Laser-induced plasmas in micromachined fused silica cavities

Zeng

Mao

Liu

et al. 2003

Applied Physics Letters

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Cavity formation is a frequent result in many laser ablation applications. Although most theoretical investigations have been devoted to laser ablation on a flat surface, the development of a laser plasma inside a cavity is of both fundamental as well as practical significance. In this study, the temperature and electron number density of laser-induced plasmas in fused silica cavities were determined using spectroscopic methods. The effects of cavity aspect ratio on plasma properties were investigated. The temperature and electron number density of laser-induced plasma were measured to be much higher and to decrease faster for a plasma inside a cavity than on the flat surface. Cavity wall influences on the plasma expansion are discussed.

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supporting

confidence: 84%

mentioning

confidence: 99%

mentioning

confidence: 99%

“…For an adiabatic expansion, the expressions for plasma temperature and electron number density as a function of time are [9] T and ,…”

mentioning

confidence: 99%

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Laser-induced plasmas in micromachined fused silica cavities

Zeng

Mao

Liu

et al. 2003

Applied Physics Letters

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“…With increasing laser irradiance, a dramatic change in the plasma characteristics and a sharp increase of mass removal were observed using high power nanosecond lasers and silicon samples [11,12]. The threshold irradiance was about 20 GW/cm 2 .…”

Section: Introductionmentioning

confidence: 98%

Laser–plasma interactions in fused silica cavities

Zeng

Mao

et al. 2004

Journal of Applied Physics

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The effect of laser energy on formation of a plasma inside a cavity was investigated. The temperature and electron number density of laser-induced plasmas in a fused silica cavity were determined using spectroscopic methods, and compared with laser ablation on a flat surface. Plasma temperature and electron number density during laser ablation in a cavity with aspect ratio of 4 increased faster with irradiance after the laser irradiance reached a threshold of 5 GW/cm 2 . The threshold irradiance of particulate ejection was lower for laser ablation in a cavity compared with on a flat surface; the greater the cavity aspect ratio, the lower the threshold irradiance. The ionization of silicon becomes saturated and the crater depths were increased approximately by an order of magnitude after the irradiance reached the threshold. Phase explosion was discussed to explain the large change of both plasma characteristics and mass removal when irradiance increased beyond a threshold value. Self-focusing of the laser beam was discussed to be responsible for the decrease of the threshold in cavities.

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Influence of Plume Properties on Thin Film Composition in Pulsed Laser Deposition

Ojeda-G-P

Döbeli

Lippert

2018

Adv Materials Inter

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Despite the apparent simplicity of pulsed laser deposition, consistent deposition of thin films with the desired thickness, composition, crystallinity, and quality still remains challenging. This article explores the influence of process parameters with respect to film thickness and composition, two key aspects for thin films which have a very strong effect on film properties, possible applications, and characterization. Using five perovskite materials, a systematic analysis of different process parameters, e.g., target material, deposition pressure, fluence, substrate temperature or target to substrate distance, is performed. The results are classified under target ablation, plasma expansion, and substrates effects, which provide vital guidance to reduce the degree of trial and error when producing thin films. Moreover, they enable the understanding of what should be considered, and avoided for the deposition of thin films.

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Early phase laser induced plasma diagnostics and mass removal during single-pulse laser ablation of silicon

Cited by 186 publications

References 25 publications

Laser-induced plasmas in micromachined fused silica cavities

Laser-induced plasmas in micromachined fused silica cavities

Laser–plasma interactions in fused silica cavities

Influence of Plume Properties on Thin Film Composition in Pulsed Laser Deposition

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