Phys. Chem. Chem. Phys.
 2024
DOI: 10.1039/d3cp05385g
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Early events in the mechanism of single-source chemical vapor deposition of zirconium and hafnium diboride: a computational investigation

Sergei Prokvolit,
Erqian Mao,
Thomas G. Gray

Abstract: Chemical vapor deposition (CVD) of group 4 metal-diboride ceramics from a single source is a versatile technique that finds many applications from hypersonic flight to microelectronics.

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