E‐ and H‐mode transition in a low pressure inductively coupled ammonia plasma

Draškovič-Bračun, Aljaž; Mozetič, Miran; Zaplotnik, Rok

doi:10.1002/ppap.201700105

Cited by 10 publications

(9 citation statements)

References 35 publications

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“…In contrast, the plasma in the H-mode is characterized by large electron density and lower electron temperature. In our case, plasma is in the H-mode at the discharge power of 200 W and in the E-mode at the power of 25 W. Detailed description of the discharge modes in ammonia plasma is provided in [29]. The significant dissociation of ammonia gas upon plasma conditions assures functionalization of the polymer surface with nitrogen-containing functional groups.…”

Section: Resultsmentioning

confidence: 99%

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Rapid Functionalization of Polytetrafluorethylene (PTFE) Surfaces with Nitrogen Functional Groups

et al. 2021

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The biocompatibility of body implants made from polytetrafluoroethylene (PTFE) is inadequate; therefore, the surface should be grafted with biocompatible molecules. Because PTFE is an inert polymer, the adhesion of the biocompatible film may not be appropriate. Therefore, the PFTE surface should be modified to enable better adhesion, preferably by functionalization with amino groups. A two-step process for functionalization of PTFE surface is described. The first step employs inductively coupled hydrogen plasma in the H-mode and the second ammonia plasma. The evolution of functional groups upon treatment with ammonia plasma in different modes is presented. The surface is saturated with nitrogen groups within a second if ammonia plasma is sustained in the H-mode at the pressure of 35 Pa and forward power of 200 W. The nitrogen-rich surface film persists for several seconds, while prolonged treatment causes etching. The etching is suppressed but not eliminated using pulsed ammonia plasma at 35 Pa and 200 W. Ammonia plasma in the E-mode at the same pressure, but forward power of 25 W, causes more gradual functionalization and etching was not observed even at prolonged treatments up to 100 s. Detailed investigation of the XPS spectra enabled revealing the surface kinetics for all three cases.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Rapid Functionalization of Polytetrafluorethylene (PTFE) Surfaces with Nitrogen Functional Groups

et al. 2021

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“…Additionally, a N 2 gas discharge constitutes excited species such as N, N + , N 2 + , etc. [ 245 ], whereas an NH 3 plasma can constitute H, N, N 2 , NH, NH 2 , N 2 H 2 , N 2 H, NH 2 + , NH 3 + , and NH 4 + excited species [ 246 , 247 , 248 , 249 ]. Well-known reducing agent hydrazine (N 2 H 4 ) has also been observed at certain conditions in NH 3 plasma [ 250 , 251 ].…”

Section: Plasma-assisted Reduction Of Gomentioning

confidence: 99%

Plasma Assisted Reduction of Graphene Oxide Films

2021

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The past decade has seen enormous efforts in the investigation and development of reduced graphene oxide (GO) and its applications. Reduced graphene oxide (rGO) derived from GO is known to have relatively inferior electronic characteristics when compared to pristine graphene. Yet, it has its significance attributed to high-yield production from inexpensive graphite, ease of fabrication with solution processing, and thus a high potential for large-scale applications and commercialization. Amongst several available approaches for GO reduction, the mature use of plasma technologies is noteworthy. Plasma technologies credited with unique merits are well established in the field of nanotechnology and find applications across several fields. The use of plasma techniques for GO development could speed up the pathway to commercialization. In this report, we review the state-of-the-art status of plasma techniques used for the reduction of GO-films. The strength of various techniques is highlighted with a summary of the main findings in the literature. An analysis is included through the prism of chemistry and plasma physics.

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“…Note that the mode transitions and hysteresis of ICP sources are very complicated. Besides the above representative features, it still exhibits research values in the topics of reactive gas mixtures, such as O 2 [30], CF 4 /Ar [31], SO 2 [32], ammonia [33] and so on and double hysteresis loop [29], inverse hysteresis [34], spatial characteristics [35], optical emission [36], electrical diagnostics [37], instability of electronegative plasma source [38] and so on. To the author, the exploration of precursors that triggers hysteresis, for instance, metastables and multistep ionizations [13,21], electron energy distribution function [39], power coupling efficiency [40], sheath [24,41], external circuit [26,27] and nonlinear mechanisms [13] and so on, is the most attractive topic.…”

Section: Conclusion and Further Remarksmentioning

confidence: 99%

Mode Transition and Hysteresis in Inductively Coupled Plasma Sources

Zhao¹

2019

Plasma Science and Technology - Basic Fundamentals and Modern Applications

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In this chapter, the characteristics of low-temperature inductively coupled plasma sources, that is, non-equilibrium, weakly ionized and bounded plasma, are described. The phenomenon of mode transition and hysteresis is one of the main physics aspects that happens in this source. Via a hybrid model, the behaviors of plasma parameters, electron kinetics and neutral species during mode transition are presented. Still, the role of metastables and multistep ionization on triggering the hysteresis is investigated. Using a fluid model that couples the equivalent circuit module, the discontinuity of mode transition and hysteresis are observed by tuning the matching network impedance. The work indicates the mutual interaction between the plasma and the circuit excites hysteresis. Besides these findings, the other important aspects of this phenomenon are briefly discussed. To the author, the exploration on the precursors that trigger hysteresis is the most attractive topic. The investigations advance the improvement of analytical theory, numerical modeling and experimental diagnostics of low-temperature plasma physics.

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E‐ and H‐mode transition in a low pressure inductively coupled ammonia plasma

Cited by 10 publications

References 35 publications

Rapid Functionalization of Polytetrafluorethylene (PTFE) Surfaces with Nitrogen Functional Groups

Rapid Functionalization of Polytetrafluorethylene (PTFE) Surfaces with Nitrogen Functional Groups

Plasma Assisted Reduction of Graphene Oxide Films

Mode Transition and Hysteresis in Inductively Coupled Plasma Sources

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