“…Thus, the significantly smaller Ga/Zn ratio seen in 500 nm or lower thickness films is attributed to the possible loss of Ga by diffusion into SiO 2 /Si, owing to its high diffusivity. 68 …”
The effect of thickness of Ga doped ZnO (GZO) layer on the performance of GZO/p-Si heterojunctions fabricated by reactive co-sputtering of Zn–GaAs target is investigated.
“…Thus, the significantly smaller Ga/Zn ratio seen in 500 nm or lower thickness films is attributed to the possible loss of Ga by diffusion into SiO 2 /Si, owing to its high diffusivity. 68 …”
The effect of thickness of Ga doped ZnO (GZO) layer on the performance of GZO/p-Si heterojunctions fabricated by reactive co-sputtering of Zn–GaAs target is investigated.
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