“…Figure 4 shows the dependences of the concentrations of electrons and holes, as well as the electric field strength, on the distance to the surface at the moment of time corresponding to the trailing edge of the pulse (t = t′ + t 0 ) with energy density Q 0 = 0.5 J cm −2 (t p = 100 fs), which is higher than the silicon damage threshold. At such fluence, according to [46] (for λ ~ 800 nm), large-scale periodic structures oriented parallel to the electric field vector of the femtosecond pulse begin to form, which, according to the hypothesis of the authors of [18][19][20][21], is related to the formation of a waveguide structure by depletion of electrons in the surface layer of the semiconductor. As can be seen from the figure, the size of the layer in which the excess positive charge is mainly localized, l + , does not exceed 3-4 nm.…”