Dynamics of ionized poly(4-hydroxystyrene)-type resist polymers with tert-butoxycarbonyl-protecting group
Kazumasa Okamoto,
Yusa Muroya,
Takahiro Kozawa
Abstract:The imaging reactions of resist materials used for nano-patterning have become radiation-chemical reactions, with the shortening of wavelengths of the exposure light sources in lithography systems. The most widely used patterning materials in industrial lithography are chemically amplified resists (CAR). Understanding the deprotonation mechanism of ionized polymers (radical cations) is important for acid generation in CARs. In this study, the dynamics of radical cations in poly(4-hydroxystyrene) (PHS)–type res… Show more
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