aroused tremendous interest for potential applications in anti-counterfeiting, [15,16] display/image devices, [17][18][19] and printing, [20,21] showing great prospects for sustainable production and recycling. [11] Recently, structural colors based on perforated metal films, [39,41] silicon dioxide (SiO 2 )loaded aluminum (Al), [34] Al-silicon nitride (SiN x ) nanowire arrays, [35] metalinsulator-metal nanoresonators, [10,27,28] and Al nanopatches/cylinders have been presented. [32,40] In these cases, colorrendering samples are generally fabricated on micrometer scales by focused ion beam or electron-beam lithography. Given this drawback, multilayer stacked films, such as silver (Ag)-SiO 2 -Ag, [21] Ag-titanium oxide (TiO 2 )-Ag, [22] and Ag-amorphous silicon (a-Si)-Ag, [23] with large areas have been explored. However, the variation range of the colors from these films is usually limited, and for that reason the films cannot be applied for optical security. Furthermore, in these configurations, noble metals are usually involved, which limits their practical applications. The metal Al, with low cost, natural abundance, high stability, good adhesion to various platforms, and compatibility with the complementary-metal-oxide-semiconductor process, [42,43] has been regarded as the most promising material for a variety of practical industrial applications. Moreover, its plasma frequency is higher than that of gold (Au) or Ag, making it the most promising metal for structural colors covering the entire visible range.Here, we develop a plasmonic metasurface that consists of one-dimensional (1D) dielectric grating arrays incorporating an Al nanopatch array and a SiN x layer. The metasurface transmits polarization-dependent colors in perpendicular planes at the same incident angle, which results from the asymmetric geometric of the metasurface. A wide range of high-purity colors, including red (R), green (G), and blue (B), is obtained in the transmission by fine-tuning the period of the nanograting. A peak efficiency of ≈60% is obtained as a result of surface plasmonic resonance (SPR) and guided mode resonance (GMR). Finally, large-area (3 cm × 3 cm) samples with various grating periods are experimentally demonstrated, incorporating highthroughput and low-cost continuously variable spatial frequency photolithography, which has advantages in fabrication speed, fabrication area, and cost.Structure design. The proposed metasurface is schematically illustrated in Figure 1, where a 230 nm thick dielectric grating, a 30 nm thick Al layer and a 200 nm thick SiN x film are stacked Color printing based on plasmonic nanostructures has attracted much attention due to its broad potential applications. It is still an open question regarding how to achieve large-area plasmonic colors for practical use. In this study, large-area plasmonic metasurfaces that incorporate a dielectric grating, an aluminum nanopatch array, and a silicon nitride layer are designed and fabricated. The asymmetric geometry of the metasurfaces produces a strong ...