Durability Evaluation of Antireflection Structure Replica Mold using High Hardness and Antifouling UV-curable Resin

Kawauchi, Junya; Hiwasa, Shin; Taniguchi, Jun

doi:10.2494/photopolymer.32.143

Cited by 5 publications

(3 citation statements)

References 22 publications

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“…These lens samples were fabricated using the same process as that used in the previous study. 13,14) However, the fabricated lens that used the newly developed resin was finally baked at 100 °C for 30 min, 28) because the mold release performance of the new resin was shown to be improved by heating.…”

Section: Materials Preparationmentioning

confidence: 99%

Anti-fouling and optical characterization of micro-lens array with antireflection structure by UV-NIL

Nakamura

Kurihara

Hokari

et al. 2020

Jpn. J. Appl. Phys.

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Reflectance on an optical lens surface changes its optical characteristics. To overcome this problem, an antireflection structure (ARS) was used to prevent reflection. The resin used in previous studies was not satisfactory for the optical device, and therefore in this study, a newly developed resin was used to fabricate an optical lens with antifouling property. Experimental results showed that the fabricated optical lens exhibited an antifouling property with a higher water contact angle and a lower slip drop angle compared to those of the non-fabricated optical lens. It was also found that there was no change in the shape and reflectance of the lens even after wiping 25 times in a wiping test. Furthermore, the result of the measurement the full width at 1/e 2 of peak indicated that the fabricated lens and the non-ARS lens showed similar optical performance.

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Section: Materials Preparationmentioning

confidence: 99%

Anti-fouling and optical characterization of micro-lens array with antireflection structure by UV-NIL

Nakamura

Kurihara

Hokari

et al. 2020

Jpn. J. Appl. Phys.

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“…[10][11][12][13] However, the moth-eye structure has a lot of small and sharp needles with a height of several hundred nm to 1 μm and is easily broken during UV-NIL transfer. 14) In a previous study which used a moth-eye structure glassy carbon (GC) mold with high aspect ratio (the height was about 1 μm), defects were confirmed after 10 imprints by UV-NIL even after release treatment. 15) In contrast, in another study, a moth-eye structure GC mold with low aspect ratio was used and resin adhesion to the GC mold occurred after 350 imprints using repeated cycles of the UV-NIL machine.…”

Section: Introductionmentioning

confidence: 99%

Transfer durability of high aspect ratio moth-eye structure on glassy carbon mold using release agent

Kawauchi

Taniguchi²

2020

Jpn. J. Appl. Phys.

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The moth-eye structure is an anti-reflection structure that is expected to effective over a wide range of wavelengths and angles of incident light. In addition, since the moth-eye structure is a single layer, it can be easily replicated using ultraviolet nanoimprint lithography (UV-NIL). However the moth-eye structure is fragile, because it has a lot of small sharp needles, and it has been reported that the durability decreases as the aspect ratio increases. The moth-eye structure exhibits anti-reflection function even with a low aspect ratio, but in this study, a fragile moth-eye structure with a high aspect ratio was used to facilitate evaluation of the releasability. In this experiment, a glassy carbon mold with high aspect ratio was release treated using a newly developed release agent. Furthermore, using the "partial-filling method" led to a dramatic improvement in the durability when compared to the conventional method using repeated cycles of the UV-NIL machine.

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“…In our previous study, we developed the highthroughput fabrication of moth-eye structures (nanoneedle arrays) using UV-NIL [11][12][13][14][15]. A moth-eye structure mold was fabricated by irradiating an oxygen ion beam onto a glassy carbon (GC) substrate [16][17][18].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Moth-eye-structured Films with Two Types of Resin Separated by Micro-order Regions

Fujiwara,

Sugawara,

Taniguchi

2023

J. Photopol. Sci. Technol.

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Some organisms can control wettability for survival. Thus, these organisms are potential research targets for engineering applications. For example, a beetle is a desert dweller that captures water from fog and dew to drink. This characteristic shows potential for addressing the global water shortage. Beetle exoskeletons are composed of micropatterns with varying wettability (hydrophilic or hydrophobic). In this study, we propose a hybrid process that combines photolithography with UV nanoimprint lithography (UV-NIL). Photolithography is used to fabricate a resist micropattern on a nanopatterned substrate. In UV-NIL, the resist and UV-curable resin are released to fabricate micropatterns with different transferabilities and wettabilities. To realize this process, a resin compatible with photolithography and UV-NIL was developed.

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Durability Evaluation of Antireflection Structure Replica Mold using High Hardness and Antifouling UV-curable Resin

Cited by 5 publications

References 22 publications

Anti-fouling and optical characterization of micro-lens array with antireflection structure by UV-NIL

Anti-fouling and optical characterization of micro-lens array with antireflection structure by UV-NIL

Transfer durability of high aspect ratio moth-eye structure on glassy carbon mold using release agent

Fabrication of Moth-eye-structured Films with Two Types of Resin Separated by Micro-order Regions

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