2013
DOI: 10.1016/j.jnoncrysol.2013.06.022
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Durability and photo-electric characteristics of a mille-feuille structured amorphous selenium (a-Se)–arsenic selenide (As2Se3) multi-layered thin film

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Cited by 8 publications
(7 citation statements)
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“…A 200 nm superlattice‐Se sample was used for the TOF‐SIMS and the results are shown in Figure . The details of the fabrication and TOF‐SIMS are found in literature . From the TOF‐SIMS result, it is possible to estimate the thickness of each superlattice layer.…”
Section: Experiments and Resultsmentioning
confidence: 99%
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“…A 200 nm superlattice‐Se sample was used for the TOF‐SIMS and the results are shown in Figure . The details of the fabrication and TOF‐SIMS are found in literature . From the TOF‐SIMS result, it is possible to estimate the thickness of each superlattice layer.…”
Section: Experiments and Resultsmentioning
confidence: 99%
“…The FWHM gave values of thickness from 6 to 9 nm. These values agree with estimates made from the rotational speed and duration of deposition, and with measurements from previous work . The result confirms that across the deposition thickness, there are alternating layers of Se and As 2 Se 3 with a period of 12–18 nm.…”
Section: Experiments and Resultsmentioning
confidence: 99%
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“…At a measured thickness of 2 µm the rotational evaporation was stopped and the samples extracted. Details of the fabrication and characterization of this Se based multilayer film (hereafter referred to as multi‐Se) are found in literature …”
Section: Methodsmentioning
confidence: 99%
“…Using the rotational evaporation technique, samples of the individual materials, namely amorphous Se only, As 2 Se 3 only, and the multi-layer combination of the two materials, were fabricated [17]. The substrates were n-type Si (100), 5-8 Ω cm, single side polished wafers diced into 10 mm squares.…”
Section: Fabricationmentioning
confidence: 99%