Combined atomic/molecular layer deposition (ALD/MLD) technique enables the engineering of inorganic-organic superlattices with atomic/molecular layer accuracy for the individual layer thicknesses. Here we demonstrate how the optical and electronic properties of e-Fe 2 O 3 thin films can be gradually tuned with an insertion of monomolecular organic layers. In our e-Fe 2 O 3 : benzene superlattice (SL) structures the thickness of individual iron oxide layers varies in the range of 1-17 nm. With decreasing e-Fe 2 O 3 layer thickness, that is, SL period, the films become more transparent. Moreover revealed from the UV-vis spectra is that the indirect optical bandgap increases from %2.0 eV for e-Fe 2 O 3 up to %2.3 eV for the SL films with the shortest SL period. We foresee that the ALD/MLD approach presented here for the e-Fe 2 O 3 -benzene thin films can be exploited in fabricating many other interesting hybrid material systems with controlled optoelectronic properties.