DSA template mask determination and cut redistribution for advanced 1D gridded design

Xiao, Zigang; Du, Yuelin; Wong, Martin D. F.; Zhang, Hongbo

doi:10.1117/12.2025688

Cited by 27 publications

(18 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In [5], the authors presented a contact layer optimization scheme to optimize the standard cell library for DSA manufacturing. Paper [11] discussed DSA cut redistribution problem and presented an algorithm to redistribute the cuts in 1D design towards better DSA manufacturing. As of DSA verification, only rigorous simulation methods have been proposed [6,7,8,9].…”

Section: Related Workmentioning

confidence: 99%

Directed Self-Assembly (DSA) Template Pattern Verification

Xiao

Tian

et al. 2014

Proceedings of the 51st Annual Design Automation Conference

Self Cite

View full text Add to dashboard Cite

Directed Self-Assembly (DSA) is a promising technique for contacts/vias patterning, where groups of contacts/vias are patterned by guiding templates. As the templates are patterned by traditional lithography, their shapes may vary due to the process variations, which will ultimately affect the contacts/vias even for the same type of template. Due to the complexity of the DSA process, rigorous process simulation is unacceptably slow for full chip verification. This paper formulate several critical problems in DSA verification, and proposes a design automation methodology that consists of a data preparation and a model learning stage. We present a novel DSA model with Point Correspondence and Segment Distance features for robust learning. Following the methodology, we propose an effective machine learning (ML) based method for DSA hotspot detection. The results of our initial experiments have already demonstrated the high-efficiency of our ML-based approach with over 85% detection accuracy. Compared to the minutes or even hours of simulation time in rigorous method, the methodology in this paper validates the research potential along this direction.

show abstract

Section: Related Workmentioning

confidence: 99%

Directed Self-Assembly (DSA) Template Pattern Verification

Xiao

Tian

et al. 2014

Proceedings of the 51st Annual Design Automation Conference

Self Cite

View full text Add to dashboard Cite

show abstract

“…Section 2 presents an optimization scheme for contact layer in standard cell library [11]. Section 3 introduces an algorithm to redistribute the cuts such that the cut layer can be patterned by DSA [12]. Section 4 shows a DSA-aware detail routing algorithm to optimize the via layers such that only feasible DSA templates are used [13].…”

Section: Introductionmentioning

confidence: 99%

Layout optimization and template pattern verification for directed self-assembly (DSA)

Xiao

Guo

Wong

et al. 2015

Proceedings of the 52nd Annual Design Automation Conference

Self Cite

View full text Add to dashboard Cite

Recently, block copolymer directed self-assembly (DSA) has demonstrated great advantages in patterning contacts/vias for the 7 nm technology node and beyond. The high throughput and low process cost of DSA makes it the most promising candidate in patterning tight pitched dense patterns for the next generation lithography. Since DSA is very sensitive to the shapes and distributions of the guiding templates, it is necessary to develop new EDA algorithms and tools to address the patterning rules and constraints of the process. This paper presents a set of DSA-aware optimization techniques targeting the most urgent problems for DSA technology, including layout optimization and template pattern verification.

show abstract

“…As shown in Fig. 12 Post-routing decomposition with line-end extensions, (a) target patterns, (b) 193 nm cut [16], [56], (c) E-beam cut [7], [10], (d) guiding template with DSA cut [61]. Fig.…”

Section: Cut/trim Mask Redistributionmentioning

confidence: 99%

“…Meanwhile, DSA brings unique lithography constraints into layout design stage, where a set of 193 nm lithography-friendly guiding templates needs to be designed first before printing smaller DSA cuts. With guiding template constraints, DSA has been adopted for cut mask design and line-end extensions with a greedy scheme [61]. Mixed integer linear programming formulations and dynamic programming algorithms have been proposed to enable DSA-friendly cut mask designs [35], [36], [48], [49].…”

Section: Cut/trim Mask Redistributionmentioning

confidence: 99%

See 1 more Smart Citation

Toward Unidirectional Routing Closure in Advanced Technology Nodes

Pan

2017

IPSJ Transactions on System LSI Design Methodology

View full text Add to dashboard Cite

Abstract:In advanced technology nodes, unidirectional layout is strongly preferred for high-density metal layers for better manufacturability. The lithography printing of unidirectional layout can be tightly controlled with illumination source optimization and resolution enhancement techniques. Meanwhile, with the unidirectional layout, self-aligned double and quadruple patterning can be applied to achieve finer pitches beyond the resolutions limits of 193 nm lithography tools. However, unidirectional layout style introduces significant impacts on the physical design flow. Notably, unidirectional routing limits the standard cell pin accessibility, which makes manual cell layout design and optimization more and more challenging under modern standard cell architecture. In the routing phase, routing densities and resource competitions on lower metal layers are becoming increasingly high, where intelligent approaches are needed to resolve routing resource competitions for unidirectional routing closure. Moreover, post-routing optimization is inevitable to avoid significant engineering-changing-efforts for unidirectional routing under advanced manufacturing constraints. In this paper, we present a holistic approach, including standard pin access evaluation/optimization, pin access and routing co-optimization and post-routing optimization, to enable unidirectional routing closure in advanced technology nodes.

show abstract

DSA template mask determination and cut redistribution for advanced 1D gridded design

Cited by 27 publications

References 0 publications

Directed Self-Assembly (DSA) Template Pattern Verification

Directed Self-Assembly (DSA) Template Pattern Verification

Layout optimization and template pattern verification for directed self-assembly (DSA)

Toward Unidirectional Routing Closure in Advanced Technology Nodes

Contact Info

Product

Resources

About