Dry etching characteristics of HfAlO3 thin films in BCl3/Ar plasma using inductively coupled plasma system

Ha, Tae-Kyung; Woo, Jong‐Chang; Kim, Chang-Il

doi:10.1016/j.vacuum.2011.01.015

Cited by 3 publications

(1 citation statement)

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“…The oxygen in the hydroxyl groups interacted with the iron oxide species over the alumina surface, as observed in the HRTEM and SEM images. The O-Al bond has been reported at 527.7 eV [ 37 ], which was deconvoluted in the O 1s XPS signal for the three catalysts. The relative percentage for the peak for AFSG and AFI decreased compared to A, indicating that the iron species decreased the amount of exposed alumina on the surface ( Table 2 ).…”

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confidence: 99%

Low Concentration Fe-Doped Alumina Catalysts Using Sol-Gel and Impregnation Methods: The Synthesis, Characterization and Catalytic Performance during the Combustion of Trichloroethylene

et al. 2014

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The role of iron in two modes of integration into alumina catalysts was studied at 0.39 wt% Fe and tested in trichloroethylene combustion. One modified alumina was synthesized using the sol-gel method with Fe added in situ during hydrolysis; another modification was performed using calcined alumina, prepared using the sol-gel method and impregnated with Fe. Several characterization techniques were used to study the level of Fe modification in the γ-Al2O3 phase formed and to correlate the catalytic properties during trichloroethylene (TCE) combustion. The introduction of Fe in situ during the sol-gel process influenced the crystallite size, and three iron species were generated, namely, magnetite, maghemite and hematite. The impregnated Fe-alumina formed hematite and maghemite, which were highly dispersed on the γ-Al2O3 surface. The X-ray photoelectron spectra (XPS), FT-IR and Mössbauer spectroscopy analyses revealed how Fe interacted with the γ-Al2O3 lattice in both catalysts. The impregnated Fe-catalyst showed the best catalytic performance compared to the catalyst that was Fe-doped in situ by the sol-gel method; both had better catalytic activity than pure alumina. This difference in activity was correlated with the accessibility of the reactants to the hematite iron species on the surface. The chlorine poisoning for all three catalysts was less than 1.8%.

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Section: Resultsmentioning

confidence: 99%

Low Concentration Fe-Doped Alumina Catalysts Using Sol-Gel and Impregnation Methods: The Synthesis, Characterization and Catalytic Performance during the Combustion of Trichloroethylene

et al. 2014

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Deep reactive ion etching of alumina titanium carbide using chlorine-based plasma

Pakpum

Pussadee

2016

Surface and Coatings Technology

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Dry Etching Properties of HfAlO₃Thin Film with Addition O₂gas Using a High Density Plasma

Woo

Lee²,

Kim³

2014

Transactions on Electrical and Electronic Materials

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Dry etching characteristics of HfAlO3 thin films in BCl3/Ar plasma using inductively coupled plasma system

Cited by 3 publications

References 21 publications

Low Concentration Fe-Doped Alumina Catalysts Using Sol-Gel and Impregnation Methods: The Synthesis, Characterization and Catalytic Performance during the Combustion of Trichloroethylene

Low Concentration Fe-Doped Alumina Catalysts Using Sol-Gel and Impregnation Methods: The Synthesis, Characterization and Catalytic Performance during the Combustion of Trichloroethylene

Deep reactive ion etching of alumina titanium carbide using chlorine-based plasma

Dry Etching Properties of HfAlO₃Thin Film with Addition O₂gas Using a High Density Plasma

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Dry etching characteristics of HfAlO3 thin films in BCl3/Ar plasma using inductively coupled plasma system

Cited by 3 publications

References 21 publications

Low Concentration Fe-Doped Alumina Catalysts Using Sol-Gel and Impregnation Methods: The Synthesis, Characterization and Catalytic Performance during the Combustion of Trichloroethylene

Low Concentration Fe-Doped Alumina Catalysts Using Sol-Gel and Impregnation Methods: The Synthesis, Characterization and Catalytic Performance during the Combustion of Trichloroethylene

Deep reactive ion etching of alumina titanium carbide using chlorine-based plasma

Dry Etching Properties of HfAlO3Thin Film with Addition O2gas Using a High Density Plasma

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Dry Etching Properties of HfAlO₃Thin Film with Addition O₂gas Using a High Density Plasma