Double patterning in nanoimprint lithography

Okada, Makoto; Miyake, Hiroto; Iyoshi, Shuso; Yukawa, Takao; Katase, Tetsuya; Tone, Katsuhiko; Haruyama, Yuichi; Matsui, Shinji

doi:10.1016/j.mee.2013.06.009

Cited by 8 publications

(4 citation statements)

References 21 publications

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“…The step and repeat UV nanoimprinting machine, 19) designed and constructed by Meisyo Kiko, can automatically operate the whole imprinting processes from picking up a silicon wafer from the container, to dispensing and spincoating UV curable resist, to prebaking and cooling, to setting the wafer on the imprinting stage, to repeated shots of imprinting and to placing the imprinted wafer into the receiving case. As the machine is also equipped with a pair of load cells in the imprint head, demolding forces were recorded at every imprinting step.…”

Section: Step and Repeat Uv Nanoimprinting Machinementioning

confidence: 99%

Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient

Iyoshi

Okada

Katase

et al. 2012

Jpn. J. Appl. Phys.

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In the UV nanoimprinting process an antisticking layer such as fluorinated self-assembled monolayer (F-SAM) is grafted on the mold surface to diminish the demolding impact. These layers are supposed to deteriorate as the imprint steps mount up, resulting in defects in the cured resist layer. In this work, continuous multiple shots of UV nanoimprint were conducted in the air and in pentafluoropropane (PFP) gas environment and demolding forces in every imprint step were determined. The experiments revealed that the demolding forces for the imprint in PFP atmosphere drastically reduced compared with those in the air. Water contact angles of the mold surface were also determined in every 225 imprint steps to observe the degree of degradation of the antisticking layer. It was found that the antisticking layer was less damaged or contaminated in the PFP environment than it was in the air after a certain number of imprint steps.

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Section: Step and Repeat Uv Nanoimprinting Machinementioning

confidence: 99%

Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient

Iyoshi

Okada

Katase

et al. 2012

Jpn. J. Appl. Phys.

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“…NIL forms nanoscale patterns in a thermoplastic polymer film by deforming the polymer under high pressure at an elevated temperature with a hard mold. In recent years, both UV [9,12,13,14,15,16,17,18,19,20] and thermal [6,15,21,22,23,24] nanoimprints have demonstrated sub-10 nm resolution. At the same time, other lithography techniques with high resolution, or those with large area and low cost patterning capability, have drawn a lot of attentions.…”

Section: Introductionmentioning

confidence: 99%

Enhanced Thermal Stability of Thermoplastic Polymer Nanostructures for Nanoimprint Lithography

2019

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Thermoplastic polymer micro- and nanostructures suffer pattern decay when heated to a temperature close to or above the polymer’s glass transition temperature. In this work, we report enhanced thermal stability of polycarbonate nanostructures at temperatures well above their glass transition temperatures. Based on this observation, we develop a unique technique for high-resolution polymer patterning by polymer reflows. This technique is characterized as the precise control of polymer reflows regardless of the annealing time, which avoids the time-domain nonlinear reflow of the polymer melt. We also implement thermal nanoimprinting in a step-and-repeat fashion, which dramatically increases the throughput of the thermal nanoimprint. The enhanced pattern stability against thermal reflow also allows for multiple imprinting at the same location to generate complex resist patterns from a simple mold structure. Since modern lithography often uses thin resist films (sub-100 nm) due to the restraint from the pattern aspect ratio, the unusual annealing behavior of thin polymer films is highly relevant in sub-100 nm lithographic processing.

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“…Due to these advantages manufactures of hard disk drive and semiconductors find NIL as the most convenient production process. NIL has also been widely used in the fabrication of nanostructures for light emitting devices, memory devices, solar cell, flat panel display, and plasmonic devices, etc [17][18][19][20]. Because of its high-resolution dense pattern capability, NIL is also considered as the enabling fabrication technique for future flash based memory devices [16].…”

Section: Introductionmentioning

confidence: 99%

Nanoimprint Lithography - the Past, the Present and the Future

Rajput²,

Luo³

2016

CNANO

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Nanoimprinting lithography technique uses a very simple concept of transferring pattern of nanoscale features from a mold to a target substrate. In the past two decades, this technique has successfully broken through the barrier of laboratory scale production and become an industrial scale production technique. This article reviews major types of nanoimprint lithography techniques which are mainly base on thermal treatment, ultraviolet light exposure, laser light irradiation or electro chemical reaction. The machining mechanism and components of major nanoimprinting methods are described. A technical comparison of these methods is presented through the analysis of their state-of-the-art research advances. Moreover, the advanced applications of nanoimprint lithography in the fields of optoelectronic devices, solar cells, memory devices, nanoscale sensors and biology are presented. Finally, the article investigates the challenges faced by nanoimprint lithography and its future trend, and discusses the possible solutions to meet these challenges.

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Double patterning in nanoimprint lithography

Cited by 8 publications

References 21 publications

Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient

Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient

Enhanced Thermal Stability of Thermoplastic Polymer Nanostructures for Nanoimprint Lithography

Nanoimprint Lithography - the Past, the Present and the Future

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