1989
DOI: 10.1049/el:19890567
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Double epitaxy improves single-photon avalanche diode performance

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Cited by 131 publications
(95 citation statements)
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“…High electric fields reduce these fluctuations and FWHM values better than 30 ps have been obtained [14]. The tail is due to the minority carriers photogenerated in the neutral region beneath the junction that succeed in reaching the depletion region by diffusion and trigger the avalanche [13], [14], [21].…”
Section: Spad Devices and Quenching Circuitsmentioning
confidence: 93%
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“…High electric fields reduce these fluctuations and FWHM values better than 30 ps have been obtained [14]. The tail is due to the minority carriers photogenerated in the neutral region beneath the junction that succeed in reaching the depletion region by diffusion and trigger the avalanche [13], [14], [21].…”
Section: Spad Devices and Quenching Circuitsmentioning
confidence: 93%
“…Fig. 1 outlines the basic epitaxial structure introduced in 1988 [13] and developed in various technologies [17], [18]. The breakdown voltage is typically 20 V and the depletion layer is typically 1 m thick.…”
Section: Spad Devices and Quenching Circuitsmentioning
confidence: 99%
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“…The diffusion tail issue is also improved by the epi-substrate p-n junction, which can be reverse biased to further reduce the p-neutral region thickness. A FWHM of 55 ps [44] was achieved in the original double-epitaxial device, and a photon detection efficiency of roughly 9% for nearly 20 V overbias at 830 nm wavelength was reported [10]. The dual-junction SPAD [42] was an attempt to achieve smaller diffusion tail and superior photon-timing resolution by using two depletion regions.…”
Section: Thin Si Apdsmentioning
confidence: 99%