2023
DOI: 10.1021/acsaem.2c03220
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Double-Barrier Quantum-Well Structure: An Innovative Universal Approach for Passivation Contact for Heterojunction Solar Cells

Abstract: The main drawbacks of modern solar-cell technologies are low-quality surface passivation, recombination losses, and carrier selectivity, which limit their efficiency. Therefore, this study proposes an innovative universal approach for a doublebarrier two-dimensional (2D) quantum well (QW) passivation structure for solar cells. To this end, c-Si solar cells were examined as model cells. Preliminary investigations (e.g., contact resistance, passivation, and recombination current density) were conducted with a st… Show more

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Cited by 3 publications
(3 citation statements)
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“…[27] Since then, tremendous progress has been carried out, culminating in the implementation of the PERL architecture, which attained a record-breaking efficiency of 25%. [28] In recent years, there is growing attention in solar cells with passivating contacts, that consist of an interface oxide in combination with a deposited silicon layer doped with pentavalent element (for n-type) or trivalent element (for p-type), [29,30] which is commonly known as passivating tunnel oxide contact (TOPCon). [31] The advantages associated with TOPCon solar cells encompass several key aspects, which include: 1) compatibility with DOI: 10.1002/ente.202301031…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…[27] Since then, tremendous progress has been carried out, culminating in the implementation of the PERL architecture, which attained a record-breaking efficiency of 25%. [28] In recent years, there is growing attention in solar cells with passivating contacts, that consist of an interface oxide in combination with a deposited silicon layer doped with pentavalent element (for n-type) or trivalent element (for p-type), [29,30] which is commonly known as passivating tunnel oxide contact (TOPCon). [31] The advantages associated with TOPCon solar cells encompass several key aspects, which include: 1) compatibility with DOI: 10.1002/ente.202301031…”
Section: Introductionmentioning
confidence: 99%
“…[ 27 ] Since then, tremendous progress has been carried out, culminating in the implementation of the PERL architecture, which attained a record‐breaking efficiency of 25%. [ 28 ] In recent years, there is growing attention in solar cells with passivating contacts, that consist of an interface oxide in combination with a deposited silicon layer doped with pentavalent element (for n‐type) or trivalent element (for p‐type), [ 29,30 ] which is commonly known as passivating tunnel oxide contact (TOPCon). [ 31 ] The advantages associated with TOPCon solar cells encompass several key aspects, which include: 1) compatibility with well‐established PERC production lines, allowing for the utilization of existing high‐temperature firing processes for metal contact formation as well as front passivation and antireflection coating procedures; 2) incorporation of a full area tunneling contact, enabling enhanced fill factor (FF) by eliminating lateral carrier transport; 3) elimination of the need for laser opening by simplifying the manufacturing process; and 4) wide process flexibility and versatility with less constraints on the deposition of a‐Si:H precursor layer achievable through techniques such as low‐pressure chemical vapor deposition, [ 32–35 ] plasma‐enhanced chemical vapor deposition (PECVD), [ 36–44 ] and sputtering.…”
Section: Introductionmentioning
confidence: 99%
“…Many attempts have been made for more than two decades to deactivate the high surface density of states using several elements and compounds. Presently surface passivation topic is quite active in GaAs-related solar cells [15,[33][34][35][36][37], but without any discovery of a permanent solution to the active surface problem [2,38]. Sulfur (S) passivation has been the most promising surface treatment, significantly improving surface electrical properties and drawing considerable attention [39][40][41][42][43][44][45].…”
Section: Introductionmentioning
confidence: 99%