Dose rate and microstructure of nitrogen ion-implanted chromium steels

Кукареко, В. А.; Byeli, A. V.

doi:10.1016/s0257-8972(99)00654-4

Cited by 16 publications

(4 citation statements)

References 9 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…13,20 In the nitriding process, it is generally accepted that the ion current density is more relevant than the ion energy determining the DZ. 21,22 The chamber gases interacting with the surface play an active role in the nitrogen diffusion mechanism. For instance, oxygen has the characteristic of being easily adsorbed, profoundly changing the physic-chemical properties of the surface.…”

Section: Discussionmentioning

confidence: 99%

Influence of the ion mean free path and the role of oxygen in nitriding processes

Figueroa

Ochoa

Alvarez

2003

Journal of Applied Physics

View full text Add to dashboard Cite

In this article we report the mechanism involved in the nitriding process of stainless steel by ion implantation. The importance of the nitrogen ion mean-free path on the stainless steel nitrated layer obtained by using a broad ion source is established. The energy distribution of the nitrogen ions arriving at the substrate is basically determined by the inelastic scattering suffered by the ions on the way to the material surface, i.e., the ion mean-free-path λ. Besides this effect, the ion current density arriving at the sample surface is modified by the dispersion introduced by the collisions of the nitrogen ions with the chamber background molecules. This multiple scattering process is modeled assuming a stochastic phenomenon and its conclusions used to explain experimental results of hardness, diffusion profile, and nitrated layer thickness. A controlled oxygen-background partial pressure is also introduced and its role on the nitrated layer reported. At relatively low ion energies and oxygen partial pressures, both the diffusion zone and nitrated layer thickness are controlled by the ion current density. Indeed, they follow a linear relationship, provided that the composition of the nitrated layer does not change, i.e., the amount of incorporated nitrogen does not modify the original material crystalline phase.

show abstract

Section: Discussionmentioning

confidence: 99%

Influence of the ion mean free path and the role of oxygen in nitriding processes

Figueroa

Ochoa

Alvarez

2003

Journal of Applied Physics

View full text Add to dashboard Cite

show abstract

“…This arises from the fundamental capability of ion implantation technique to produce non-equilibrium compositions and structures unattainable by conventional treatments. Generally, medium to high energy (20 -200 keV) nitrogen ion implantation to the fluences from 10 17 to 10 18 ions/cm 2 has been shown to give a modified layer to a depth of the order of a few hundred nm [6][7][8].…”

Section: Introductionmentioning

confidence: 99%

Properties of TiN Coatings Deposited on Nitrogen Ion Implanted Steel C1045

Peruško¹,

Bibić²,

Petrović³

et al. 2007

MSF

View full text Add to dashboard Cite

The effects of nitrogen pre-implantation of AISI C1045 steel substrates on the properties of deposited TiN coatings were investigated. Nitrogen ion implantations were performed at 40 keV, to the fluences from 5x1016 – 5x1017 ions/cm2. On so prepared substrates we deposited 1.3 μm thick TiN layers by reactive sputtering. Structural characterizations of the samples were performed by grazing incidence X-ray diffraction analysis (GXRD), standard X-ray diffraction analysis (XRD), and scanning electron microscopy (SEM). Microhardness was measured by Vicker’s method. The obtained results indicate the formation of iron-nitrides in the near surface region of the substrates, more pronounced for higher implanted fluences. The structure of the deposited TiN coatings shows a strong dependence on the pre-implantation of the substrates, which is attributed to the changed local structure at the surface. Ion implantation and deposition of hard TiN coatings induce an increase of the microhardness of this low performance steel of more than eight times.

show abstract

“…Implantation can cause changes in surface composition, morphology and chemical bond structure leading to the formation of new compounds and can also be an effective method to improve mechanical and chemical properties [9][10][11][12][13][14].…”

Section: Introductionmentioning

confidence: 99%

Nitrogen ion implantation and characterization of tungsten oxide films

Tesfamichael

Bell

2005

SPIE Proceedings

View full text Add to dashboard Cite

This paper implements modification of tungsten oxide film using ion implantation and a physical characterization of the film. The film was implanted with nitrogen at energies between 10 keV and 40 keV and ion dose range 10 14 -10 16 cm -2 .The surface morphology of the film after implantation has been modified as observed using electron microscopy. The transmittance of the film was found to decrease with increasing implantation energy and ion dose as measured using conventional spectrophotometer. Depth profile of nitrogen was analyzed using Secondary Ion Mass Spectroscopy (SIMS) and found a peak of nitrogen across the depth of the implanted layer. The amount of nitrogen was found to increase with increasing ion dose and energy. From electron diffraction a broader diffraction rings were revealed from both the implanted and un-implanted layers, indicating that the crystalline properties of the tungsten oxide film after ion implantation remains the same.

show abstract

Dose rate and microstructure of nitrogen ion-implanted chromium steels

Cited by 16 publications

References 9 publications

Influence of the ion mean free path and the role of oxygen in nitriding processes

Influence of the ion mean free path and the role of oxygen in nitriding processes

Properties of TiN Coatings Deposited on Nitrogen Ion Implanted Steel C1045

Nitrogen ion implantation and characterization of tungsten oxide films

Contact Info

Product

Resources

About