2013
DOI: 10.1166/rits.2013.1004
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Doping of Materials During Manufacture <I>p</I>–<I>n</I>-Junctions and Bipolar Transistors. Analytical Approaches to Model Technological Approaches and Ways of Optimization of Distributions of Dopants

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Cited by 74 publications
(135 citation statements)
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“…We calculate distribution of concentration of dopant in space in time by method of averaging of function corrections [25][26][27][28][29][30]. To use the method we re-write Eqs.…”
Section: Methods Of Solutionmentioning
confidence: 99%
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“…We calculate distribution of concentration of dopant in space in time by method of averaging of function corrections [25][26][27][28][29][30]. To use the method we re-write Eqs.…”
Section: Methods Of Solutionmentioning
confidence: 99%
“…To use the method we re-write Eqs. (1), (3) and (5) We determined average values of the first-order approximations of the considered concentrations by using the following standard relations [25][26][27][28][29][30] ( )…”
Section: Methods Of Solutionmentioning
confidence: 99%
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