2014
DOI: 10.1021/nn502676g
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Doping Dependence of the Raman Spectrum of Defected Graphene

Abstract: We investigate the evolution of the Raman spectrum of defected graphene as a function of doping. Polymer electrolyte gating allows us to move the Fermi level up to 0.7 eV, as directly monitored by in situ Hall-effect measurements. For a given number of defects, we find that the intensities of the D and D' peaks decrease with increasing doping. We assign this to an increased total scattering rate of the photoexcited electrons and holes, due to the doping-dependent strength of electron-electron scattering. We pr… Show more

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Cited by 331 publications
(343 citation statements)
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“…2 compares the Raman spectra of the as-prepared SLG on Si/SiO 2 and after transfer on GaAs. The analysis of G peak position, Pos(G), its full width at half maximum, FWHM(G), Pos(2D) and the area and intensity ratios of 2D and G peaks allow us to monitor the amount and type of doping 33,35,37,38 . This indicates a small pdoping for the as-prepared sample, decreasing to below 100 meV for the transferred sample 33,35,37 .…”
Section: Resultsmentioning
confidence: 99%
“…2 compares the Raman spectra of the as-prepared SLG on Si/SiO 2 and after transfer on GaAs. The analysis of G peak position, Pos(G), its full width at half maximum, FWHM(G), Pos(2D) and the area and intensity ratios of 2D and G peaks allow us to monitor the amount and type of doping 33,35,37,38 . This indicates a small pdoping for the as-prepared sample, decreasing to below 100 meV for the transferred sample 33,35,37 .…”
Section: Resultsmentioning
confidence: 99%
“…52,53 In such studies, an accurate determination of E F (hence of the gate capacitance) as a function of the gate voltage is a critical requirement. However, as opposed to solid state FETs, in which the oxide dielectric constant and thickness can be known with accuracy, the thickness of the electrical double layer may be highly arXiv:1502.06849v2 [cond-mat.mes-hall] 16 Apr 2015 sensitive to the device geometry, fluctuate spatially and vary over time. This further highlights the need for (i) robust methods for device fabrication and, (ii) accurate tools to experimentally measure the gate capacitance.…”
Section: Introductionmentioning
confidence: 99%
“…We also get I(D)/I(G)∼0.14, indicating that the fabrication process does introduce significant defects in the SLG electrode [57,60].…”
Section: Introductionmentioning
confidence: 70%