2015
DOI: 10.1002/adfm.201501019
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Donor‐Induced Performance Tuning of Amorphous SrTiO3 Memristive Nanodevices: Multistate Resistive Switching and Mechanical Tunability

Abstract: Metal-oxide valence-change memristive devices are the key contenders for the development of multilevel nonvolatile analog memories and neuromorphic computing architectures. Reliable low energy performance and tunability of nonlinear resistive switching dynamics are essential to streamline the highdensity circuit level integration of these devices. Here, manipulation of room temperature-synthesized defect chemistry is employed to enhance and tune the switching characteristics of high-performance amorphous SrTiO… Show more

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Cited by 71 publications
(74 citation statements)
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“…The VCM mechanism is normally created in the structure sandwiched between the resistive layer and inert metal electrodes . The resistive layer is normally a transition metal oxide such as binary metal oxides (HfO x , TaO x , and ZnO), and perovskites such as BiFeO 3 and SrTiO 3 . Different from ECM, the CF consists of ion vacancies .…”
Section: Requirements For Artificial Synapsesmentioning
confidence: 99%
“…The VCM mechanism is normally created in the structure sandwiched between the resistive layer and inert metal electrodes . The resistive layer is normally a transition metal oxide such as binary metal oxides (HfO x , TaO x , and ZnO), and perovskites such as BiFeO 3 and SrTiO 3 . Different from ECM, the CF consists of ion vacancies .…”
Section: Requirements For Artificial Synapsesmentioning
confidence: 99%
“…Our fabricated ReRAMs are attributed to localized accumulation of oxygen vacancies along the defect structure across the device [51,52]. Oxygen vacancy is known to facilitate the formation and rupture of nano-filaments, which is responsible for the bipolar switching between HRS and LRS [52]. Electrical characterization of ReRAM and measurement data was gathered with Keithley 4200 Semiconductor Characterization System (SCS).…”
Section: A-sto-based Reram Fabricationmentioning
confidence: 99%
“…Full details on the electrical, electroforming, and switching characteristics of the a-STO memristors can be found in Refs. [51][52][53].…”
Section: A-sto-based Reram Fabricationmentioning
confidence: 99%
“…Recently, multilevel storage in a single memristor has attracted great interests to enhance the storage density without affecting scalability. [155][156][157] A thin fast ionic conductors 158 AgInSbTe (AIST) layer was introduced into an Ag/MAPbI 3 / FTO structure as an Ag reservoir and protecting layer ( Figure 24A). 97 The memristor showed tristate RS in the RESET process, providing multilevel memory capability ( Figure 24B).…”
Section: Flexible and Multilevel Applicationsmentioning
confidence: 99%