2017
DOI: 10.1038/srep45591
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DNA-Mediated Patterning of Single Quantum Dot Nanoarrays: A Reusable Platform for Single-Molecule Control

Abstract: We present a facile strategy of general applicability for the assembly of individual nanoscale moieties in array configurations with single-molecule control. Combining the programming ability of DNA as a scaffolding material with a one-step lithographic process, we demonstrate the patterning of single quantum dots (QDs) at predefined locations on silicon and transparent glass surfaces: as proof of concept, clusters of either one, two, or three QDs were assembled in highly uniform arrays with a 60 nm interdot s… Show more

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Cited by 19 publications
(23 citation statements)
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“…( f ) A schematic representation of precise positioning of DNA origami in small holes (diameter up to 200 nm) in thin metal films [ 143 ]. ( g ) Schematic representation of FIB patterning and covalent attachment of amino-terminated DNA triangles on the patterned surface via amidation reaction [ 144 ]. Adapted with permission from [ 138 ] copyright 2018, [ 95 ] copyright 2010, [ 143 ] copyright 2014 American Chemical Society.…”
Section: Figurementioning
confidence: 99%
“…( f ) A schematic representation of precise positioning of DNA origami in small holes (diameter up to 200 nm) in thin metal films [ 143 ]. ( g ) Schematic representation of FIB patterning and covalent attachment of amino-terminated DNA triangles on the patterned surface via amidation reaction [ 144 ]. Adapted with permission from [ 138 ] copyright 2018, [ 95 ] copyright 2010, [ 143 ] copyright 2014 American Chemical Society.…”
Section: Figurementioning
confidence: 99%
“…Two approaches were implemented to selectively position individual DNA origami over arrays of up to 3.68 mm 2 using focussed ion beam (FIB) and electron-beam (EBL) lithography. The first approach implemented was a one-step FIB lithographic process ( Figure 3 metal-coated SiO 2 substrates 20,36 . Chromium and gold were initially evaporated onto SiO 2 substrates to form 2 nm and 8 nm layers, respectively.…”
Section: Nanoscale Surface Lithography For Selective Positioning Of Fmentioning
confidence: 99%
“…Fabrication of the FIB substrates was carried out as previously described 36 . Briefly, Glass coverslips were cleaned in Piranha solution before chromium and gold were evaporated on the surface in 2 nm and 8 nm thick layers (respectively).…”
Section: Fabrication Of Fib and Ebl Substratesmentioning
confidence: 99%
“…In this context, DNA is a powerful molecule for the assembly of nanoarchitectures with precise spatial arrangement, [29][30][31][32][33][34][35][36] and it has been employed in different nanomaterials, from 0D to 3D. 37,38 Moreover, DNA allows the formation of dynamic architectures, due to its ability to reconfigure, as a response to different stimuli, depending on the nucleotide sequence.…”
mentioning
confidence: 99%