DLC Coating by HiPIMS: The Influence of Substrate Bias Voltage

Nakao, Setsuo; Yukimura, Ken; Nakano, Shizuka; Ogiso, Hisato

doi:10.1109/tps.2013.2256800

Cited by 44 publications

(15 citation statements)

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“…[21][22][23] Many researchers have reported the preparation of DLC films by HiPIMS. [24][25][26][27][28][29] DeKoven et al 24) reported that the ion-toneutral ratio for carbon in HiPIMS of pure Ar was much lower than those for other materials used for HiPIMS owing to the higher ionization potential of carbon than that of metal. However, Sarakinos et al showed an increase of 40-45% in the amount of sp 3 C bonds in DLC films prepared by HiPIMS of Ar.…”

Section: Introductionmentioning

confidence: 99%

Preparation of hydrogenated diamond-like carbon films using high-density pulsed plasmas of Ar/C₂H₂ and Ne/C₂H₂ mixture

Kimura

Kamata

2016

Jpn. J. Appl. Phys.

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Hydrogenated diamond-like carbon films are prepared using reactive high-density pulsed plasmas of Ar/C 2 H 2 and Ne/C 2 H 2 mixture in the total pressure range from 0.5 to 2 Pa. The plasmas are produced using a reactive high-power impulse magnetron sputtering (HiPIMS) system. A negative pulse voltage of %500 V is applied to the substrate for a period of 15 µs in the afterglow mode. The growth rate does not strongly depend on the type of ambient gas but it markedly increases to about 2.7 µm/h at a C 2 H 2 fraction of 10% and a total pressure of 2 Pa with increasing C 2 H 2 fraction. The marked increase in the growth rate means that the HiPIMS system can be regarded as a plasma source for the chemical vapor deposition process. The hardness of the films prepared by Ne/C 2 H 2 plasmas is somewhat higher than that of the films prepared by Ar/C 2 H 2 plasmas under the same operating conditions, and the difference becomes larger as the pressure increases. The hardness of the films prepared by Ne/C 2 H 2 plasmas ranges between 11 and 18 GPa. In the Raman spectra, two very broad overlapping bands are assigned as the G (graphite) and D (disorder) bands. The peak position of the G band is roughly independent of the total pressure, whereas the FWHM of the G peak decreases with increasing total pressure as a whole.

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Section: Introductionmentioning

confidence: 99%

Preparation of hydrogenated diamond-like carbon films using high-density pulsed plasmas of Ar/C₂H₂ and Ne/C₂H₂ mixture

Kimura

Kamata

2016

Jpn. J. Appl. Phys.

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“…The substrates were biased during the deposition using RF biasing, with a DC self-bias of −100 V during C deposition, and at −50 V for Ti deposition. The biasing voltage at −100 V was chosen based on previous studies that showed an optimum around this values in terms of film density and hardness [9,22,28,31]. All samples were obtained at a total pressure of 2 Pa, maintained by an automatic valve that regulates the pumping section.…”

Section: Methodsmentioning

confidence: 99%

A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings

et al. 2020

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In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impinging ions is adjusted by using RF (Radio Frequency) biasing on the substrate at −100 V DC self-bias. Addition of acetylene to the working Ar+Ne atmosphere is investigated as an alternative to Ar sputtering, to improve process stability and coatings quality. Peak current is maintained constant, providing reliable comparison between different deposition conditions used in this study. The main advantages of adding acetylene to the Ar+Ne gas mixture are an increase of deposition rate by a factor of 2, when comparing to the Ar+Ne process. Moreover, a decrease of the number of surface defects, from ~40% surface defects coverage to ~1% is obtained, due to reduced arcing. The mechanical and tribological properties of the deposited DLC films remain comparable for all investigated gas compositions. Nanoindentation hardness of all coatings is in the range of 25 to 30 GPa, friction coefficient is between 0.05 and 0.1 and wear rate is in the range of 0.47 to 0.77 × 10−6 mm3 N−1m−1.

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“…Sporadic attempts have also been made to deposit a-C films with HiPIMS. However, in most of the studies so far, the characterization of plasma has been the focus, rather than the properties of resulting films [8][9][10][11][12]. Lattemann etal.…”

Section: Introductionmentioning

confidence: 99%

Density and microstructure of a-C thin films

Kumar

Gupta

Deshpande

et al. 2018

Diamond and Related Materials

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DLC Coating by HiPIMS: The Influence of Substrate Bias Voltage

Cited by 44 publications

References 44 publications

Preparation of hydrogenated diamond-like carbon films using high-density pulsed plasmas of Ar/C₂H₂ and Ne/C₂H₂ mixture

Preparation of hydrogenated diamond-like carbon films using high-density pulsed plasmas of Ar/C₂H₂ and Ne/C₂H₂ mixture

A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings

Density and microstructure of a-C thin films

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DLC Coating by HiPIMS: The Influence of Substrate Bias Voltage

Cited by 44 publications

References 44 publications

Preparation of hydrogenated diamond-like carbon films using high-density pulsed plasmas of Ar/C2H2 and Ne/C2H2 mixture

Preparation of hydrogenated diamond-like carbon films using high-density pulsed plasmas of Ar/C2H2 and Ne/C2H2 mixture

A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings

Density and microstructure of a-C thin films

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Preparation of hydrogenated diamond-like carbon films using high-density pulsed plasmas of Ar/C₂H₂ and Ne/C₂H₂ mixture

Preparation of hydrogenated diamond-like carbon films using high-density pulsed plasmas of Ar/C₂H₂ and Ne/C₂H₂ mixture