2011
DOI: 10.1016/j.jnoncrysol.2010.11.030
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Distribution of hydrogen in low temperature passivated amorphous silicon (a-Si:H) films from neutron reflectivity

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Cited by 4 publications
(2 citation statements)
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“…Using the high hydrogen dilutions is possibly essential in achieving a high passivation degree of hydrogen of the silicon bonds in the volume deficiencies. [17] The deposition rate is maintained for the strong hydrogen diluted conditions when compared to deposition from pure silane (~15 nm/min) at low pressures. For the "protocrystalline" deposition regime the deposition rate typically quenches to below 5 nm/min.…”
Section: Methodsmentioning
confidence: 99%
“…Using the high hydrogen dilutions is possibly essential in achieving a high passivation degree of hydrogen of the silicon bonds in the volume deficiencies. [17] The deposition rate is maintained for the strong hydrogen diluted conditions when compared to deposition from pure silane (~15 nm/min) at low pressures. For the "protocrystalline" deposition regime the deposition rate typically quenches to below 5 nm/min.…”
Section: Methodsmentioning
confidence: 99%
“…Oxygen acts as an acceptor in OSCs and its states distribute along the edge of the HOMO. Primarily, oxygen doping pre-empties the donor-like trap states 32 induced by static/dynamic disorder or other factors 33 (i.e., it releases the E F pinning) and thus yields mobile hole carriers in the HOMO (i.e., it renders the E F close to the edge of the HOMO), which is in analogy to the role of hydrogen in a -Si 34 . Meanwhile, the width of depletion layer and the height of the Schottky barrier at the metal/semiconductor interfaces is reduced due to the oxygen doping, which facilitates carrier injection through thermionic emission (TE) and thermionic field emission (TFE) 35 .…”
Section: Resultsmentioning
confidence: 99%