Distributed ferromagnetic enhanced inductive plasma source for plasma processing

Abstract

New experimental data on the plasma density profiles have been obtained for a low-frequency (100 kHz) distributed ferromagnetic enhanced inductive plasma source at different locations of inductive discharges. An ability to control the plasma density profiles in a large gas discharge chamber in order to achieve a uniform treatment of a substrate is demonstrated. The differences between the obtained results and literature data for a distributed ferromagnetic enhanced inductive plasma source combined with a radio-frequency inductive discharge are discussed.