2010
DOI: 10.1016/j.jnoncrysol.2009.11.003
|View full text |Cite
|
Sign up to set email alerts
|

Dissolution of thin SiO2-coatings – Characterization and evaluation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
7
0

Year Published

2010
2010
2021
2021

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 9 publications
(8 citation statements)
references
References 21 publications
1
7
0
Order By: Relevance
“…The inferior dissolution of the coatings cured at higher temperature can be accounted to a higher film density and degree of polymerization, which may induce a more advanced chemical stability of the coatings. These results are in agreement with reported data [56,57], where SiO x films with poor polymerization and high defect density showed higher dissolution rates in neutral aqueous solutions. Further, the considerable amount of easily hydrolyzed residual Si-H moieties indicated by the FT-IR analysis in the low temperature cures may contribute to the coating instability [58].…”
Section: Neutral Salt Spray Testingsupporting
confidence: 94%
“…The inferior dissolution of the coatings cured at higher temperature can be accounted to a higher film density and degree of polymerization, which may induce a more advanced chemical stability of the coatings. These results are in agreement with reported data [56,57], where SiO x films with poor polymerization and high defect density showed higher dissolution rates in neutral aqueous solutions. Further, the considerable amount of easily hydrolyzed residual Si-H moieties indicated by the FT-IR analysis in the low temperature cures may contribute to the coating instability [58].…”
Section: Neutral Salt Spray Testingsupporting
confidence: 94%
“…The hydrolysis of silica proceeds from the surface and is catalyzed by OH − ; hence, its rate increases rapidly with increasing pH and in particles with high surface area (18,19,22). To quantify the extent of dissolution of the mesoporous silica nanoparticles, the supernatant collected after incubation was subjected to the silicomolybdic acid spectrophotometric assay to measure the amount of soluble silicic acid (17).…”
Section: Resultsmentioning
confidence: 99%
“…Films of intermediate thickness between 250 and 550 nm perform best, with hydrolytic resistance values close to 0.1 mL. This behavior can be explained by considering that the hydrolytic resistance of a film depends on its microstructure [7,[22][23][24][25][26], and its thickness [22,27]:…”
Section: Methodsmentioning
confidence: 99%