Disorder-mediated ordering by self-interfactant effect in organic thin film growth of pentacene on silicon

Kury, P.; Roos, K. R.; Thiện, Đoàn Văn Hồng; Möllenbeck, S.; Wall, Dirk; Hoegen, M. Horn‐von; Heringdorf, F.‐J. Meyer zu

doi:10.1016/j.orgel.2008.02.006

Cited by 14 publications

(17 citation statements)

References 34 publications

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“…Small organic molecules on reactive surfaces typically show a growth mechanism that is known as Stranski–Krastanov (SK) growth, where the initial layer (wetting layer) consists of lying molecules that are strongly bonded to the substrate with a multilayer of either standing or lying molecules forming on top. Examples for such film formations include para-hexaphenyl on Au(111) 20 and mica(001), 16,21,22 pentacene on Au(111), 23 and Si(111), 24 as well as quaterphenyl on Au(111) 25 and PTCDA on Ag(111). 26 Other systems, such as PTCDA on Si(100) 27 show layer-like growth for low substrate temperatures which switches to island growth for higher substrate temperatures.…”

Section: Resultsmentioning

confidence: 99%

“…One could speculate as to the reason for the different crystallization behavior of indigo on the sputter cleaned and carbon covered silicon oxide surface, and for the generally weaker tendency of these molecules to crystallize, as compared to rod-like organic molecules, e.g., pentacene 23,24 or hexaphenyl. 16,20–22 We believe that the main reason for this behavior is that the indigo molecules exhibit a chirality in the adsorbed state.…”

Section: Resultsmentioning

confidence: 99%

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Film growth, adsorption and desorption kinetics of indigo on SiO2

Scherwitzl¹,

Resel²,

Winkler³

2014

The Journal of Chemical Physics

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Organic dyes have recently been discovered as promising semiconducting materials, attributable to the formation of hydrogen bonds. In this work, the adsorption and desorption behavior, as well as thin film growth was studied in detail for indigo molecules on silicon dioxide with different substrate treatments. The material was evaporated onto the substrate by means of physical vapor deposition under ultra-high vacuum conditions and was subsequently studied by Thermal Desorption Spectroscopy (TDS), Auger Electron Spectroscopy, X-Ray Diffraction, and Atomic Force Microscopy. TDS revealed initially adsorbed molecules to be strongly bonded on a sputter cleaned surface. After further deposition a formation of dimers is suggested, which de-stabilizes the bonding mechanism to the substrate and leads to a weakly bonded adsorbate. The dimers are highly mobile on the surface until they get incorporated into energetically favourable three-dimensional islands in a dewetting process. The stronger bonding of molecules within those islands could be shown by a higher desorption temperature. On a carbon contaminated surface no strongly bonded molecules appeared initially, weakly bonded monomers rather rearrange into islands at a surface coverage that is equivalent to one third of a monolayer of flat-lying molecules. The sticking coefficient was found to be unity on both substrates. The desorption energies from carbon covered silicon dioxide calculated to 1.67 ± 0.05 eV for multilayer desorption from the islands and 0.84 ± 0.05 eV for monolayer desorption. Corresponding values for desorption from a sputter cleaned surface are 1.53 ± 0.05 eV for multilayer and 0.83 ± 0.05 eV for monolayer desorption.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Film growth, adsorption and desorption kinetics of indigo on SiO2

Scherwitzl¹,

Resel²,

Winkler³

2014

The Journal of Chemical Physics

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“…An example of the latter layer growth is 5A on Si(111). 25 Contrary, on inert, flat substrates, organic molecules tend to form films consisting of standing molecules, beginning already in the first layer, like for 6P on sputtered mica, 9 or 5A on SiO 2 . 26 …”

Section: Discussionmentioning

confidence: 99%

Initial Steps of Rubicene Film Growth on Silicon Dioxide

et al. 2013

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The film growth of the conjugated organic molecule rubicene on silicon dioxide was studied in detail. Since no structural data of the condensed material were available, we first produced high quality single crystals from solution and determined the crystal structure. This high purity material was used to prepare ultrathin films under ultrahigh vacuum conditions, by physical vapor deposition. Thermal desorption spectroscopy (TDS) was applied to delineate the adsorption and desorption kinetics. It could be shown that the initial sticking coefficient is only 0.2 ± 0.05, but the sticking coefficient increases with increasing coverage. TDS further revealed that first a closed, weakly bound bilayer develops (wetting layer), which dewets after further deposition of rubicene, leading to an island-like layer. These islands are crystalline and exhibit the same structure as the solution grown crystals. The orientation of the crystallites is with the (001) plane parallel to the substrate. A dewetting of the closed bilayer was also observed when the film was exposed to air. Furthermore, Ostwald ripening of the island-like film takes place under ambient conditions, leading to films composed of few, large crystallites. From TDS, we determined the heat of evaporation from the multilayer islands to be 1.47 eV, whereas the desorption energy from the first layer is only 1.25 eV.

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“…Unlike surfactants which are active at the surface of (multi)layer systems, the concept of interfactants was introduced for layers which are more strongly bound to the substrate than the film to be grown [30], and which affect the kinetics of the subsequently growing molecular layers. Interfactant layers are generally discussed in the context of growth occurring from species adsorbed from the gas phase, and they may form wetting layers separating molecular films from a substrate [31] and constituting a diffusion barrier [32]. Moieties forming interfactant layers can be atomic, molecular or ionic species, and the concept could be extended to strongly adsorbed polymeric species affecting the growth of subsequent molecular layers from a condensed phase.…”

Section: Characterization Of Coated Am50 Substratesmentioning

confidence: 99%