1997
DOI: 10.1063/1.119642
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Dislocation-free InSb grown on GaAs compliant universal substrates

Abstract: An innovative compliant GaAs substrate was formed by wafer bonding a 30 Å GaAs layer to a bulk GaAs crystal with a large angular misalignment inserted about their common normals. InSb epitaxial layers, which is about 15% lattice mismatched to GaAs, have been grown on both compliant substrates and conventional GaAs substrates. Transmission electron microscopy studies showed that the InSb films grown on the compliant substrates have no measurable threading dislocations, whereas the InSb films on the conventional… Show more

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Cited by 93 publications
(44 citation statements)
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“…The system displays two interfaces along the [001] axis: i) a heterointerface between the lattice-mismatched layer and the twist-bonded layer and ii) a twist-bonded interface between this twist-bonded layer and the host substrate below. The position of rows of atoms above (below) the twist-bonded interface is denoted by integer numbers nI and n 2 (n 3 and n 4 ) in surface lattice units along the [110] and [1][2][3][4][5][6][7][8][9][10] directions. The twist-bonded layer and the host substrate are rotated one with respect to the other around the [001] axis by 16.26' that corresponds to the grain boundary 12s.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The system displays two interfaces along the [001] axis: i) a heterointerface between the lattice-mismatched layer and the twist-bonded layer and ii) a twist-bonded interface between this twist-bonded layer and the host substrate below. The position of rows of atoms above (below) the twist-bonded interface is denoted by integer numbers nI and n 2 (n 3 and n 4 ) in surface lattice units along the [110] and [1][2][3][4][5][6][7][8][9][10] directions. The twist-bonded layer and the host substrate are rotated one with respect to the other around the [001] axis by 16.26' that corresponds to the grain boundary 12s.…”
Section: Methodsmentioning
confidence: 99%
“…The way this sticking is done reveals the way the relaxation is presumed to act. If an intermediate viscous layer is used to stick the compliant layer to its host substrate, an elastic relaxation is guessed acting [6,7] whereas any attempt to weaken the interface by for example twisting and/or tilting the compliant axes relative to the host substrate ones means that some kind of plastic relaxation is expected [8][9][10][11][12][13].…”
Section: Introductionmentioning
confidence: 99%
“…CnG (Y. H. Lo) pioneered the original concept of the practical compliant substrate [1] and produced the f~st twist-bonded "compliant universal substrates" of GaAs/GaAs and Si/Si [5][6][7]. Initial results suggested major reductions in threading defect densities for strained layer growth on twist-bonded substrates vs. bulk substrates.…”
Section: The Cornell Group (Cng)mentioning
confidence: 99%
“…Again, this seems rather unlikely, but cannot yet be discounted. THE CORNELL APPROACH: A second experiment using a different type of substrate raised the excitement levels to even greater heights [5][6][7]. The compliant substrate in this case was essentially just two GaAs wafers bonded together with an in-plane twist misorientation, and then thinned from one side to create a thin single crystal layer joined to a handle wafer by a twist grain boundary (see Figure 2b).…”
Section: Ifilmmentioning
confidence: 99%
“…The first utilized a metal 7 or glass [8][9][10][11] media to join the template and handle. The second approach employed twist-bonded ͑TB͒ substrates, 12,13 in which the template was directly bonded to the handle with an intentional azimuthal angular misorientation . The exact influence of the critical template/handle interface on film relaxation is uncertain at present.…”
mentioning
confidence: 99%