Directed self-oriented self-assembly of block copolymers using topographical surfaces

Choi, Jae-Won; Carter, K.R.; Russell, Thomas P.

doi:10.1016/b978-0-08-100250-6.00005-5

Cited by 1 publication

(1 citation statement)

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“…For BCPs, DSA is required to produce lithographically interesting structures with acceptable control over these requirements. Numerous DSA schemes that use lithography to pattern chemical , or topographical , guide features have been reported. By carefully tailoring the dimensions and the surface chemistry of the guiding patterns, BCP films can be induced to produce many device-relevant features − with low pattern registration error. , In addition, DSA processes can repair defects and misplaced features in the guide pattern lithography .…”

Section: Resultsmentioning

confidence: 99%

Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

et al. 2017

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The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high etch selectivity. Reactive ion etching was used to selectively remove the PVBD block, and fingerprint patterns were subsequently transferred into an underlying chromium hard mask and carbon layer. DSA of the block copolymer (BCP) features resulted from orienting PVBD-b-PDSS on guidelines patterned by nanoimprint lithography. A density multiplication factor of 4× was achieved through a hybrid chemo-/grapho-epitaxy process. Cross-sectional scanning tunneling electron microscopy/electron energy loss spectroscopy (STEM/EELS) was used to analyze the BCP profile in the DSA samples. Wetting layers of parallel orientation were observed to form unless the bottom and top surface were neutralized with a surface treatment and top coat, respectively.

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